Improvement of plasmon-enhanced photocurrent generation by interference of TiO2 thin film

Journal of Physical Chemistry C

Volumn 117, Issue 47, 2013, Pages 24733-24739

  Shi, Xu ^a   Ueno, Kosei ^a,b   Oshikiri, Tomoya ^a   Misawa, Hiroaki ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONSTRUCTIVE INTERFERENCE; ENERGY CONVERSION DEVICES; INCIDENT PHOTON-TO-CURRENT EFFICIENCIES; PHOTO-ELECTRODES; PHOTOCURRENT GENERATIONS; PLASMON RESONANCES; STRONG DEPENDENCES; THIN-FILM ELECTRODE;

ATOMIC LAYER DEPOSITION; DEPOSITION; ENERGY CONVERSION; FILM THICKNESS; GOLD DEPOSITS; PLASMONS; SURFACE PLASMON RESONANCE; THIN FILMS; TITANIUM DIOXIDE;

GOLD;

EID: 84889569300     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp408472g     Document Type: Article

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