Sputter deposited ZnO porous films for sensing applications

Materials Research Society Symposium Proceedings

Volumn 1494, Issue , 2013, Pages 71-76

  Borysiewicz, Michał A ^a   Dynowska, Elzbieta ^a,b   Kolkovsky, Valery ^b   Wielgus, Maciej ^a,c   Gołaszewska, Krystyna ^a   Kamińska, Eliana ^a   Ekielski, Marek ^a   Struk, Przemysław ^d   Pustelny, Tadeusz ^d   Piotrowska, Anna ^a  

^a ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

^b INSTITUTE OF PHYSICS   (Poland)

^c WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^d SILESIAN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

EX-SITU ANNEALING; LIQUID METHANOL; NANOPOROUS ZNO; OXYGEN FLOW; RESISTANCE MEASUREMENT; SENSING APPLICATIONS; SURFACE-BASED; TWO-STEP APPROACH;

MATERIALS SCIENCE;

SENSORS;

EID: 84889264620     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2013.34     Document Type: Conference Paper

References (5)

1. Xiang Liu, Xiaohua Wu, Hui Cao, and R. P. H. Chang, J. Appl. Phys. 95, 3141 (2004)
2. J. Shi, H. Hong, Y. Ding, Y. Yang, F. Wang, W. Cai and X. Wang, J. Mater. Chem. 21, 9000 (2011)
3. M.A. Borysiewicz, E. Dynowska, V. Kolkovsky, J. Dyczewski, M. Wielgus, E. Kamińska, A. Piotrowska, Phys. Stat. Sol. A 209, 2463 (2012)
4. M.F.M. Costa, J. Phys. Conf. Series 274, 012053 (2011)
5. Z.Y. Yang and M. Zhao, J. Opt. A: Pure Appl. Opt. 9 872 (2007)