Photocatalytic activity of metal-inserted WO3 thin films prepared by RF magnetron sputtering

Journal of Nanoscience and Nanotechnology

Volumn 13, Issue 10, 2013, Pages 7053-7055

  Kim, Soon Wook ^a   Kim, Hong Ki ^a   Choi, Hyun Wook ^a   Yoo, Dae Hwang ^a   Kim, Eui Jung ^a   Hahn, Sung Hong ^a  

^a University of Ulsan   (South Korea)

Author keywords

Photocatalytic Activity; RF Magnetron Sputtering; Tungsten Oxide Thin Film

Indexed keywords

ABSORPTION SPECTROMETRY; DECOMPOSITION EFFICIENCY; PHOTOCATALYTIC ACTIVITIES; PHOTOEXCITED ELECTRONS; RADIO FREQUENCY MAGNETRON SPUTTERING METHOD; RF-MAGNETRON SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; TUNGSTEN OXIDE THIN FILMS;

ABSORPTION SPECTROSCOPY; AROMATIC COMPOUNDS; GOLD DEPOSITS; MAGNETRON SPUTTERING; PLATINUM; QUARTZ; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PHOTOCATALYSIS;

EID: 84888995145     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2013.7733     Document Type: Article

References (8)

1. M. Akiyo, O. Nobuto, N. Shinichi, and S. Yuzo, J. Nanosci. Nanotechnol. 12, 6 (2012).
2. Y. H. Tseng, I. G. Chang, Y. Tai, and K. W. Wu, J. Nanosci. Nanotechnol. 12, 1 (2012).
3. G. H. Lee and M. S. Kim, Electron. Mater. Lett. 6, 77 (2010).
4. Y. Chen, S. Y. Yang, and J. Kim, Electron. Mater. Lett. 8, 301 (2012).
5. S. Zh. Karazhanov and Y. Zhang, Phys. Rev. B. 68, 233204 (2003).
6. J. Cao, B. Luo, H. Lin, and S. Chen, J. Hazard. Mater. 190, 700 (2011).
7. M. Y. Kang, C. B. Cao, X. Y. Xu, and B. Lian, Chinese Sci. Bull. 53, 335 (2008).
8. S. Zhu, X. Liu, Z. Chen, C. Liu, C. Feng, J. Gu, Q. Liu, and D. Zhang, J. Mater. Chem. 20, 9126 (2010).