Water oxidation using a cobalt monolayer prepared by underpotential deposition

Langmuir

Volumn 29, Issue 47, 2013, Pages 14728-14732

  Marsh, David A ^a   Yan, Wenbo ^a   Liu, Yu ^a   Hemminger, John C ^a   Penner, Reginald M ^a   Borovik, A S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL APPLICATIONS; GOLD ELECTRODES; GRAZING INCIDENCE X-RAY DIFFRACTION; ITS EFFICIENCIES; SURFACE BOUNDS; UNDERPOTENTIAL DEPOSITION; WATER OXIDATION; WETTED SURFACE AREA;

ATOMIC FORCE MICROSCOPY; COBALT; DEPOSITION; ELECTROCATALYSTS; ELECTROLYSIS; GOLD; MONOLAYERS; OXIDATION; PHOTOELECTRONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

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EID: 84888580786     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la403038e     Document Type: Article

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