Electrochemical deposition of metal ions as a low energy alternative to conventional methods

International Journal of Precision Engineering and Manufacturing

Volumn 14, Issue 6, 2013, Pages 881-889

  Bhat, Abhimanyu ^a   Bourell, David ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Electrodeposition; Infiltration; Laser Sintering

Indexed keywords

COPPER; ELECTRODEPOSITION; ELECTRODES; ELECTROLYTES; FELT; FELTS; GRAPHITE; HYDROGEN EVOLUTION REACTION; INFILTRATION; LASER HEATING; METAL IONS; POROSITY; POROUS MATERIALS; POROUS SILICON; REACTION RATES; REDUCTION; SILICON CARBIDE; SINTERED CARBIDES; SINTERING; WETTING; WETTING AGENTS;

BUTLER-VOLMER EQUATION; CONVENTIONAL METHODS; HIGHLY POROUS MATERIALS; LASER SINTERING; OPERATING PARAMETERS; STEADY-STATE CONDITION; THEORETICAL MODELING; UNIFORM DISTRIBUTION;

ELECTROCHEMICAL DEPOSITION;

EID: 84888364511     PISSN: 22347593     EISSN: 20054602     Source Type: Journal    
DOI: 10.1007/s12541-013-0116-9     Document Type: Article

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