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Volumn 5, Issue 5, 2013, Pages

Improving the efficiency of silicon solar cells using the novel gas-lift effect texturing approach

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL METHODS; ELECTRON-HOLE PAIR GENERATION; OVERALL EFFICIENCY; POWER EFFICIENCY; PRODUCTION COST; REAL SURFACE AREAS; SOLAR CELL DEVICES; WET ANISOTROPIC ETCHING;

EID: 84887483148     PISSN: 19417012     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4821220     Document Type: Article
Times cited : (1)

References (6)
  • 1
    • 33846328753 scopus 로고    scopus 로고
    • TMAH texturisation and etching of interdigitated back-contact solar cells
    • P. Papet, O. Nichiporuk, A. Fave, A. Kaminski, B. Bazer-Bachi, and M. Lemiti, " TMAH texturisation and etching of interdigitated back-contact solar cells.," Materials Science-Poland, 1043-1049 (2006); available online at http://materialsscience.pwr.wroc.pl/bi/vol24no4/articles/IMIM-16.pdf.
    • (2006) Materials Science-Poland , pp. 1043-1049
    • Papet, P.1    Nichiporuk, O.2    Fave, A.3    Kaminski, A.4    Bazer-Bachi, B.5    Lemiti, M.6
  • 2
    • 17744409087 scopus 로고
    • TMAH/IPA anisotropic etching characteristics
    • 10.1016/0924-4247(93)80125-Z
    • A. Merlos, M. Acero, M. H. Bao, J. Bausells, and J. Esteve, " TMAH/IPA anisotropic etching characteristics.," Sens. Actuators A 37-38, 737-743 (1993). 10.1016/0924-4247(93)80125-Z
    • (1993) Sens. Actuators A , vol.3738 , pp. 737-743
    • Merlos, A.1    Acero, M.2    Bao, M.H.3    Bausells, J.4    Esteve, J.5
  • 3
    • 84857742461 scopus 로고    scopus 로고
    • A new approach for improving the silicon texturing process using gas-lift effect
    • 10.1088/0022-3727/45/10/105102
    • M. Amouzgar and M. Kahrizi, " A new approach for improving the silicon texturing process using gas-lift effect.," J. Phys. D Appl. Phys. 45, 105102 (2012). 10.1088/0022-3727/45/10/105102
    • (2012) J. Phys. D Appl. Phys. , vol.45 , pp. 105102
    • Amouzgar, M.1    Kahrizi, M.2
  • 4
    • 84874860393 scopus 로고    scopus 로고
    • Modeling and optimizing the gas-lift effect system for texturing
    • 10.1088/0022-3727/46/13/135107
    • M. Amouzgar and M. Kahrizi, " Modeling and optimizing the gas-lift effect system for texturing.," J. Phys. D Appl. Phys. 46, 135107 (2013). 10.1088/0022-3727/46/13/135107
    • (2013) J. Phys. D Appl. Phys. , vol.46 , pp. 135107
    • Amouzgar, M.1    Kahrizi, M.2
  • 5
    • 0003821752 scopus 로고
    • edited by W. Kern (Noyes Publishing, Park Ridge, NJ), Cha.
    • Handbook of Semiconductor Cleaning Technology, edited by, W. Kern, (Noyes Publishing, Park Ridge, NJ, 1993), Chap..
    • (1993) Handbook of Semiconductor Cleaning Technology


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.