Field-emission performance and structural change mechanism of multiwalled carbon nanotubes by oxygen plasma treatment

Thin Solid Films

Volumn 547, Issue , 2013, Pages 202-206

  Kim, Jin Young ^a   Jeong, Taewon ^b   Baik, Chan Wook ^b   Park, Shang Hyeun ^b   Han, Intaek ^b   Kim, Gon Ho ^c   Yu, Segi ^d  

^a Sungkyunkwan University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c Seoul National University   (South Korea)

^d Hankuk University of Foreign Studies   (South Korea)

Author keywords

Carbon nanotube; Field emission; Oxygen plasma; Plasma treatment

Indexed keywords

ANALYTICAL ESTIMATIONS; CHANGE MECHANISMS; FIELD-EMISSION PROPERTIES; FOWLER-NORDHEIM PLOTS; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; PLASMA TREATMENT; THERMAL CHEMICAL VAPOR DEPOSITION;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; MULTIWALLED CARBON NANOTUBES (MWCN); OXYGEN; PLASMAS;

PLASMA APPLICATIONS;

EID: 84886776866     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.03.059     Document Type: Conference Paper

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