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Volumn 2, Issue , 1999, Pages 1113-1116

New experimental findings on the enhanced MOSFET degradation at elevated temperature

Author keywords

[No Author keywords available]

Indexed keywords

DRAIN CURRENT; HOT ELECTRONS; IMPACT IONIZATION; TEMPERATURE DISTRIBUTION;

EID: 84886697001     PISSN: 21593442     EISSN: 21593450     Source Type: Conference Proceeding    
DOI: 10.1109/TENCON.1999.818619     Document Type: Conference Paper
Times cited : (2)

References (8)
  • 1
    • 0023120899 scopus 로고
    • Substrate current at cryogenic temperatures : Measurments and two dimensional model for CMOS technology
    • A. K. Henning, N. N. Chan, J. T. Watt and J. D. Plummer, "Substrate current at cryogenic temperatures : Measurments and two dimensional model for CMOS technology, " IEEE Trans. Electron Device, vol. ED-34, 110. 1, pp. 64-73, 1987
    • (1987) IEEE Trans. Electron Device , vol.34 , Issue.1-110 , pp. 64-73
    • Henning, A.K.1    Chan, N.N.2    Watt, J.T.3    Plummer, J.D.4
  • 2
    • 0031639820 scopus 로고    scopus 로고
    • Temperature Dependence of substrate current and hot carrier induced degradation at low drain bias
    • P. Aminzadeh, M. Alavi, D. Scharftter, "Temperature Dependence of substrate current and hot carrier induced degradation at low drain bias, " Tech. Dig. of Sym. on VLSI Technology, pp. 178-179, 1998
    • (1998) Tech. Dig. of Sym. on VLSI Technology , pp. 178-179
    • Alavi, A.M.1    Scharftter, D.2
  • 3
    • 0029406134 scopus 로고
    • Temperature Dependence of gate and substrate currents in the CHE crossover regime
    • D. Esseni, L. Selmi, E. Sangiorgi, R. Bez, and B. Ricco, "Temperature Dependence of gate and substrate currents in the CHE crossover regime, " IEEE Electron Device Lett. vo1. 16, no. 11, pp. 506-508, 1995
    • (1995) IEEE Electron Device Lett , vol.16 , Issue.11 , pp. 506-508
    • Esseni, D.1    Selmi, L.2    Sangiorgi, E.3    Bez, R.4    Ricco, B.5
  • 4
    • 84945713471 scopus 로고
    • Hot electron induced MOSFET degradation model, monitor, improvement
    • C. Hu, S. C. Tam, F. C. Hsu, P. K. KO, T. Y. Chan and K. W. Terrill, " Hot electron induced MOSFET degradation model, monitor, improvement, " IEEE Trans. Electron Devices. vol. ED-32, no. 2, pp. 375-385, 1985
    • (1985) IEEE Trans. Electron Devices , vol.32 , Issue.2 , pp. 375-385
    • Hu, C.1    Tam, S.C.2    Hsu, F.C.3    Ko, P.K.4    Chan, T.Y.5    Terrill, K.W.6
  • 7
    • 0017449653 scopus 로고
    • Emission probability of hot electrons from silicon into silicon dioxide
    • T. H. Ning, C. M. Osburn, and H. N. Yu, "Emission probability of hot electrons from silicon into silicon dioxide, " J. of Applied Physics, vo1. 48, no. 1, pp. 286-293, 1977
    • (1977) J. of Applied Physics , vol.48 , Issue.1 , pp. 286-293
    • Ning, T.H.1    Osburn, C.M.2    Yu, H.N.3
  • 8
    • 0021427595 scopus 로고
    • Temperature dependence of hot electron induced degradation in MOSFETs
    • F. C. Hsu, and K. Y. Chiu, " Temperature dependence of hot electron induced degradation in MOSFETs" IEEE Electron Device Lett. , vo1. 5, pp. 148-151, 1984
    • (1984) IEEE Electron Device Lett. , vol.5 , pp. 148-151
    • Hsu, F.C.1    Chiu, K.Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.