n-Type microcrystalline silicon oxide layer and its application to high-performance back reflectors in thin-film silicon solar cells

Current Applied Physics

Volumn 13, Issue 4, 2013, Pages 743-747

  Kim, Soohyun ^a   Lee, Hongcheol ^a   Chung, Jin Won ^a   Ahn, Seh Won ^a   Lee, Heon Min ^a  

^a LG Electronics Inc   (South Korea)

Author keywords

Back reflector; Light trapping; n Type microcrystalline silicon oxide; Thin film silicon solar cell

Indexed keywords

EFFICIENCY; MICROCRYSTALLINE SILICON; OPEN CIRCUIT VOLTAGE; OXIDE FILMS; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFLECTION; REFRACTIVE INDEX; SILICON; SILICON OXIDES; SOLAR CELLS; THIN FILM SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION;

BACK REFLECTORS; CELL PERFORMANCE; ELECTRICAL CHARACTERISTIC; HYDROGENATED MICROCRYSTALLINE SILICON; ITS APPLICATIONS; LIGHT-TRAPPING; THIN-FILM SI SOLAR CELLS; THIN-FILM SILICON SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 84885853264     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2012.11.017     Document Type: Article

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