Wafer scale processing of plasmonic nanoslit arrays in 200mm CMOS fab environment

ECS Transactions

Volumn 50, Issue 12, 2013, Pages 413-422

  Malachowski, K ^a   Verbeeck, R ^a   Dupont, T ^a   Chen, C ^a   Li, Y ^a   Musa, S ^a   Stakenborg, T ^a   Sabuncuoglu Tezcan, D ^a   Van Dorpe, P ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CHEMICAL SENSORS; CMOS INTEGRATED CIRCUITS; ELECTRIC FIELDS; NANOSTRUCTURES; PLASMONICS; PLASMONS; QUANTUM OPTICS;

LARGE-SCALE FABRICATION; MOLECULAR SENSING; NANOSLIT ARRAYS; OPTICAL RESONANCE; SINGLE MOLECULE; SURFACE ENHANCED RAMAN; WAFER SCALE PROCESS; WAFER-SCALE PROCESSING;

NANOANTENNAS;

EID: 84885811290     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/05012.0413ecst     Document Type: Conference Paper

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