Improvement of graphene quality synthesized by cluster ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 307, Issue , 2013, Pages 260-264

  Zhang, Z D ^a   Wang, Z S ^a   Zhang, R ^a   Wu, X Y ^b   Fu, D J ^a   Liu, J R ^a  

^a WUHAN UNIVERSITY   (China)

^b BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Cluster; Graphene; Ion implantation; Raman

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION IMPLANTATION; IONS; SCANNING ELECTRON MICROSCOPY;

CLUSTER; CLUSTER ION IMPLANTATION; IMPLANTATION DOSE; MORPHOLOGY AND STRUCTURES; RAMAN; THERMAL PROCESS; VACUUM THERMAL ANNEALING;

GRAPHENE;

EID: 84885184885     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2012.11.075     Document Type: Article

References (17)

1. K.S. Novoselov, A.K. Geim, S.V. Morozov, D. Jiang, Y. Zhang, S.V. Dubonos, I.V. Grigorieva, A.A. Firsov, Science 306 (2004) 666.
2. Y.B. Zhang, Y.B. Tan, H.L. Stomer, P. Kim, Nature 438 (2005) 201.
3. F. Miao, S. Wijeratne, Y. Zhang, U.C. Coskun, W. Bao, C.N. Lau, Science 317 (2007) 1530.
4. H.B. Heersche, P. Jarillo-Herrero, J.B. Oostinga, L.M.K. Vandersypen, A.F. Morpurgo, Nature 446 (2007) 56.
5. S.V. Morozov, K.S. Novoselov, M.I. Katsnelson, F. Schedin, L.A. Ponomarenko, D. Jiang, A.K. Geim, Phys. Rev. Lett. 97 (2006) 016801.
6. S. Pisana, M. Lazzeri, C. Casiraghi, K.S. Novoselov, A.K. Geim, A.C. Ferrari, F. Mauri, Nat. Mater. 6 (2007) 198.
7. C. Berger, Z. Song, T. Li, X. Li, A.Y. Ogbazghi, R. Feng, Z. Dai, A.N. Marchenkov, E.H. Conrad, P.N. First, W.A. de Heer, J. Phys. Chem. B 108 (2004) 19912.
8. F. Schedin, A.K. Geim, S.V. Morozov, E.W. Hill, P. Blake, M.I. Katsnelson, K.S. Novoselov, Nat. Mater. 6 (2007) 652.
9. B. Trauzettel, D.V. Bulaev, L. Loss, G. Burkard, Nat. Phys. 3 (2007) 192.
10. S. Garaj, W. Hubbard, J.A. Golovchenk, Appl. Phys. Lett. 97 (2010) 183103.
11. L. Baraton, Z.B. He, C.S. Lee, J.L. Maurice, C.S. Cojocaru, A.F. Gourgues- Lorenzon, Y.H. Lee, D. Pribat, Nanotechnology 22 (2011) 085601.
12. Z.S. Wang, Z.D. Zhang, R. Zhang, S.X. Wang, D.J. Fu, J.R. Liu, Chinese Sci. Bull. 27 (2012) 3556.
13. R. Zhang, Z.D. Zhang, Z.S. Wang, S.X. Wang, D.J. Fu, J.R. Liu, Appl. Phys. Lett. 101 (2012) 011905.
14. H.H. Andersen, H.L. Bay, J. Appl. Phys. 45 (1974) 953.
15. A.C. Ferrari, J.C. Meyer, V. Scardaci, C. Casiraghi, M. Lazzeri, F. Mauri, S. Piscanec, D. Jiang, K.S. Novoselov, S. Roth, A.K. Geim, Phys. Rev. Lett. 97 (2006) 187401.
16. S. Thiele, A. Reina, P. Healey, J. Kedzierski, P. Wyatt, P.L. Hsu, C. Keast, J. Schaefer, J. Kong, Nanotechnology 21 (2010) 015601.
17. A.T.S. Reina, X. Jia, S. Bhaviripudi, M.S. Dresselhaus, J.A. Schaefer, J. Kong, Nano Res. 2 (2009) 509.