Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton

Microelectronic Engineering

Volumn 110, Issue , 2013, Pages 369-373

  Yamamoto, Hiroki ^a   Ohnuma, Akira ^b   Ohtani, Bunsho ^b   Kozawa, Takahiro ^a  

^a OSAKA UNIVERSITY   (Japan)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Bottom up nanofabrication; Self assembled monolayer (SAM); Top down nanofabrication; Water soluble dithiols

Indexed keywords

BIOMOLECULES; ELECTRON BEAM LITHOGRAPHY; MONOLAYERS; NANOPARTICLES; NANOTECHNOLOGY; NUCLEIC ACIDS; POLYETHYLENE GLYCOLS; PROTEINS; SELF ASSEMBLED MONOLAYERS; SELF ASSEMBLY;

AU NANOPARTICLE; BOTTOM-UP NANOFABRICATION; DITHIOLS; LINE-AND-SPACE PATTERNS; PATTERNED ARRAYS; REACTION FIELDS; SELF-ASSEMBLY TECHNIQUE; TOPDOWN;

GOLD;

EID: 84885173042     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2013.02.066     Document Type: Article

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