Effect of oxygen partial pressure on the morphological properties and the photocatalytic activities of titania thin films on unheated substrates by sputtering deposition method

Advanced Materials Research

Volumn 770, Issue , 2013, Pages 18-21

  Pansila, P Pungboon ^a   Witit Anun, Nirun ^b,c   Chaiyakun, Surasing ^b,c  

^a KASETSART UNIVERSITY   (Thailand)

^b BURAPHA UNIVERSITY   (Thailand)

^c THAILAND CENTER OF EXCELLENCE IN PHYSICS   (Thailand)

Author keywords

Morphology; Oxygen partial pressure; Photocatalytic; Sputtering; Thin film; TiO2

Indexed keywords

LOW OXYGEN PARTIAL PRESSURE; METHYLENE BLUE DEGRADATIONS; MORPHOLOGICAL PROPERTIES; OXYGEN PARTIAL PRESSURE; PHOTO-CATALYTIC; PHOTOCATALYTIC ACTIVITIES; THICKNESS OF THE FILM; TIO;

AROMATIC COMPOUNDS; ATOMIC FORCE MICROSCOPY; MORPHOLOGY; PARTIAL PRESSURE; PHOTOCATALYSIS; PHOTODEGRADATION; POSITIVE IONS; SPUTTERING; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84884938864     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.770.18     Document Type: Conference Paper

References (9)

1. 2 photo catalysts by reactive DC magnetron sputter deposition, Thin solid films. 515 (2006) 1176-1181.
2. 2 Thin Films Prepared by RF Magnetron Sputtering, Micro. J. 36 (2005) 549-551.
3. 2 Films in argon-oxigen gas mixtures:theory and experiment, Surf. Coat. Tech. 116-119 (1999) 933-937.
4. 2 Films Prepared by R.F. Magnetron sputtering at A Low Temperature, Thin Solid Films. 281-282 (1996) 427-430.
5. 2 Films Sputtered on Unheated Substrate. Surf. Coat. Tech. 153 (2002) 93-99.
6. 2 Thin Film by Reactive RF Magnetron Sputtering Using Oxygen radical, J. Alloy Compd. 499 (2008) 735-738.
7. 2 thin films by AFM and TEM, Surface Coating & Technology. 140 (2001) 155-160.
8. 2 Films Sputtered on Unheated Substrate, Surf. Coat. Tech. 153 (2002) 93-99.
9. 2 film on TCA-8113 epitheliallike cells, Surf. Coat. Tech. 200 (2006) 6155-6160.