Preparation of W-Cu functionally graded material coated with CVD-W for plasma-facing components

Journal of Nuclear Materials

Volumn 442, Issue 1-3 SUPPL.1, 2013, Pages

  Song, Jiupeng ^a   Yu, Yang ^a   Zhuang, Zhigang ^a   Lian, Youyun ^b   Liu, Xiang ^b   Qi, Yang ^c  

^a XIAMEN TUNGSTEN CO LTD   (China)

^b SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

^c NORTHEASTERN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITIONS (CVD); COLUMNAR GRAIN SIZE; HOMOGENEOUS MICROSTRUCTURE; PLASMA-FACING COMPONENTS; RESIDUAL POROSITY; SURFACE LAYERS; TRANSITION LAYERS; W-CU COMPOSITES;

BEAMS AND GIRDERS; COATINGS; DEPOSITION; FACINGS; FUNCTIONALLY GRADED MATERIALS; MICROSTRUCTURE; PLASMA SPRAYING; SINTERING; TUNGSTEN ALLOYS; TUNGSTEN COMPOUNDS;

CHEMICAL VAPOR DEPOSITION;

EID: 84884906831     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2013.01.326     Document Type: Article

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