Modelling VOC source impacts on high ozone episode days observed at a mountain summit in Hong Kong under the influence of mountain-valley breezes

Atmospheric Environment

Volumn 81, Issue , 2013, Pages 166-176

  Lam, S H M ^a,b   Saunders, S M ^b   Guo, H ^a   Ling, Z H ^a   Jiang, F ^c   Wang, X M ^d   Wang, T J ^c  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

^c NANJING UNIVERSITY   (China)

^d GUANGZHOU INSTITUTE OF GEOCHEMISTRY   (China)

Author keywords

Master Chemical Mechanism (MCM); Photochemical model; Photochemical Ozone Creation Potential (POCP); Positive Matrix Factorization (PMF); Volatile Organic Compounds (VOC)

Indexed keywords

MASTER CHEMICAL MECHANISM; PHOTOCHEMICAL MODELING; PHOTOCHEMICAL OZONE CREATION POTENTIALS; POSITIVE MATRIX FACTORIZATION; VOLATILE ORGANIC COMPOUND (VOC);

LANDFORMS; MATRIX ALGEBRA; OZONE; VOLATILE ORGANIC COMPOUNDS;

COMPUTER SIMULATION;

OZONE; VOLATILE ORGANIC COMPOUND;

AIR SAMPLING; ANTICYCLONE; CHEMICAL POLLUTANT; MESOSCALE MOTION; MOUNTAIN REGION; OZONE; PHOTOCHEMISTRY; PHOTOLYSIS; SENSITIVITY ANALYSIS; TOP-DOWN APPROACH; TROPOSPHERE; ULTRAVIOLET RADIATION; VOLATILE ORGANIC COMPOUND;

ARTICLE; AUTUMN; CHEMICAL MODEL; HONG KONG; PHOTOCHEMISTRY; PHOTOLYSIS; POLLUTANT; PRIORITY JOURNAL; SENSITIVITY ANALYSIS;

CHINA; HONG KONG;

EID: 84884722835     PISSN: 13522310     EISSN: 18732844     Source Type: Journal    
DOI: 10.1016/j.atmosenv.2013.08.060     Document Type: Article

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