Design of diffractive optical elements for off-axis illumination in projection lithography

Guangxue Jingmi Gongcheng/Optics and Precision Engineering

Volumn 16, Issue 11, 2008, Pages 2081-2086

  Zhang, Wei ^a   Gong, Yan ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Beam shaping; Diffractive Optical Element (DOE); Illumination; Projection lithography; Resolution enhancement

Indexed keywords

DENSITY (OPTICAL); DIFFRACTIVE OPTICS; LIGHT; LIGHT SOURCES; LIGHTING; OPTICAL DEVICES; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY;

BEAM SHAPING; FOURIER; ILLUMINATION; INTENSITY PROFILES; ITERATIVE ALGORITHMS; OPTICAL PROJECTIONS; PHASE LEVELS; PROJECTION LITHOGRAPHY; QUADRUPOLE; RESOLUTION ENHANCEMENT; SIMULATION RESULTS;

DIFFRACTIVE OPTICAL ELEMENTS;

EID: 57749091868     PISSN: 1004924X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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