Surface energy of growth and seeding side of free standing nanocrystalline diamond foils

Surface and Coatings Technology

Volumn 232, Issue , 2013, Pages 640-644

  Sobolewski, Sergej ^a   Lodes, Matthias A ^a   Rosiwal, Stefan M ^a   Singer, Robert F ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Hot filament chemical vapor deposition (HFCVD); Nanocrystalline diamond foil (NCDF); Surface energy; Surface oxidation; Wettability

Indexed keywords

CLEANING PROCESS; DIAMOND LAYERS; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; NANO-CRYSTALLINE DIAMONDS; OXYGEN PLASMAS; POLAR COMPONENTS; POLAR SURFACE ENERGY COMPONENTS; SURFACE OXIDATIONS;

ACETONE; CHEMICAL VAPOR DEPOSITION; CLEANING; CONTACT ANGLE; DIAMONDS; NUCLEATION; WETTING;

INTERFACIAL ENERGY;

EID: 84883452370     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.06.051     Document Type: Article

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