Wettability and surface energy of oxidized and hydrogen plasma-treated diamond films

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 845-850

  Ostrovskaya, L ^a   Perevertailo, V ^a   Ralchenko, V ^b   Dementjev, A ^c   Loginova, O ^a  

^a BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

^b PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

^c KURCHATOV INSTITUTE   (Russian Federation)

Author keywords

Diamond properties and applications; Hydrogenation; Surface energy; Wettability

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); HYDROGENATION; INTERFACIAL ENERGY; PLASMAS; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; SILICON; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

WETTABILITY;

DIAMOND FILMS;

PLASMA TREATMENT;

EID: 0036508227     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00636-7     Document Type: Article

References (17)