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Volumn 21, Issue 5, 2013, Pages 1056-1062

Fabrication of highly transparent self-cleaning protection films for photovoltaic systems

Author keywords

anti reflection; external quantum efficiency; hot embossing; moth eye pattern; nano pattern; solar cell; superhydrophobicity; UV nanoimprint

Indexed keywords

ANTI-REFLECTION; EXTERNAL QUANTUM EFFICIENCY; HOT-EMBOSSING; MOTHEYE; NANO PATTERN; SUPERHYDROPHOBICITY; UV-NANOIMPRINT;

EID: 84881232554     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.2203     Document Type: Article
Times cited : (37)

References (14)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.