Femtosecond pulsed laser deposition of silicon thin films

Nanoscale Research Letters

Volumn 8, Issue 1, 2013, Pages 1-6

  Murray, Matthew ^a   Jose, Gin ^a   Richards, Billy ^a   Jha, Animesh ^a  

^a UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

Chemical vapour deposition; Femtosecond pulsed laser deposition; Silicon thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; PULSED LASERS; SILICON; SUBSTRATES;

CHEMICAL VAPOUR DEPOSITION; DEPOSITION PROCESS; FEMTOSECOND PULSED-LASER DEPOSITION; GAS PRESSURES; OPTIMISATIONS; OPTOELECTRONIC APPLICATIONS; SILICON THIN FILM; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 84881224172     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-8-272     Document Type: Article

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