Photopatterneable block co-polymers for laser interference lithography

Materials Research Society Symposium Proceedings

Volumn 1412, Issue , 2011, Pages 1-6

  Alabi, Taiwo R ^a   Yuan, Dajun ^a   Das, Suman ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMER FILMS; HIERARCHICAL PATTERNS; LASER INTERFERENCE LITHOGRAPHY; LASER INTERFERENCE PATTERNING; LASER LIGHT SOURCES; POSITIVE TONE PHOTORESISTS; SEMICONDUCTOR INDUSTRY; SILICONDIOXIDE SUBSTRATES;

LIGHT SOURCES; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE;

BLOCK COPOLYMERS;

EID: 84880557996     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/opl.2012.1258     Document Type: Conference Paper

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