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Volumn 552, Issue , 2013, Pages 244-247
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Study on deposition of amorphous DLC-Si films by RF-PECVD
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Author keywords
Diamond like carbon film; PECVD; Refractive index
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Indexed keywords
AMORPHOUS SILICON;
ATOMIC FORCE MICROSCOPY;
CARBON FILMS;
DIAMOND LIKE CARBON FILMS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
GAS MIXTURES;
GASES;
HARDNESS;
MICROSTRUCTURE;
PLASMA CVD;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
DLC FILM;
ECHANICAL PROPERTIES;
FOURIER TRANSFORM INFRA RED (FTIR) SPECTROSCOPY;
RADIO FREQUENCY PLASMA CHEMICAL VAPOR DEPOSITIONS;
REACTANT GAS;
RF-PECVD;
SILICON CONCENTRATION;
SILICON SUBSTRATES;
SILICON COMPOUNDS;
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EID: 84880399901
PISSN: 10139826
EISSN: 16629795
Source Type: Book Series
DOI: 10.4028/www.scientific.net/KEM.552.244 Document Type: Conference Paper |
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Times cited : (3)
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References (9)
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