XPS study of polycrystalline diamond surfaces after annealing treatment

Surface and Coatings Technology

Volumn 228, Issue SUPPL.1, 2013, Pages

  Pan, Xiaoyu ^a   Wang, Linjun ^a   Zeng, Qingkai ^a   Shi, Lingyun ^a   Xu, Run ^a   Huang, Jian ^a   Tang, Ke ^a   Xia, Yiben ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

Diamond film; Hydrogen plasma treatment; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING TEMPERATURES; ANNEALING TREATMENTS; ELECTRONIC APPLICATION; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; HYDROGEN PLASMA TREATMENTS; HYDROGEN-TERMINATED DIAMOND; HYDROGENATED FILMS; POLYCRYSTALLINE DIAMONDS;

ANNEALING; CHEMICAL VAPOR DEPOSITION; PHOTOELECTRONS; PLASMA APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND FILMS;

EID: 84879800056     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.05.032     Document Type: Article

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