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Volumn 42, Issue 7, 2013, Pages 2114-2118
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Scalable silicon nanostructuring for thermoelectric applications
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Author keywords
e beam lithography; low doping concentrations; nanostructures; Silicon
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Indexed keywords
CURRENT LIMITATION;
DEEP REACTIVE-ION ETCHINGS;
E-BEAM LITHOGRAPHY;
ENVIRONMENTALLY-FRIENDLY;
LOW DOPING CONCENTRATIONS;
SILICON NANO STRUCTURES;
THERMOELECTRIC APPLICATION;
THERMOELECTRIC PERFORMANCE;
NANOSTRUCTURES;
SEMICONDUCTOR DOPING;
SILICON;
THERMOELECTRICITY;
SEMICONDUCTING SILICON;
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EID: 84879796310
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-013-2539-6 Document Type: Article |
Times cited : (5)
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References (10)
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