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Volumn 42, Issue 7, 2013, Pages 2114-2118

Scalable silicon nanostructuring for thermoelectric applications

Author keywords

e beam lithography; low doping concentrations; nanostructures; Silicon

Indexed keywords

CURRENT LIMITATION; DEEP REACTIVE-ION ETCHINGS; E-BEAM LITHOGRAPHY; ENVIRONMENTALLY-FRIENDLY; LOW DOPING CONCENTRATIONS; SILICON NANO STRUCTURES; THERMOELECTRIC APPLICATION; THERMOELECTRIC PERFORMANCE;

EID: 84879796310     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-013-2539-6     Document Type: Article
Times cited : (5)

References (10)
  • 8
    • 84879795411 scopus 로고    scopus 로고
    • http://www.panco.de/
  • 9
    • 84879800697 scopus 로고    scopus 로고
    • ed. O. Van der Biest, M. Gasik, and J. Vleugels (Zurich, Switzerland: Trans Tech Publications)
    • D. Platzek, G. Karpinski, C. Drasar, and E. Müller, Functionally Graded Materials VIII, ed. O. Van der Biest, M. Gasik, and J. Vleugels (Zurich, Switzerland: Trans Tech Publications, 2007), p. 587.
    • (2007) Functionally Graded Materials VIII , pp. 587
    • Platzek, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.