The formation and stability of Rh nanostructures on TiO 2 (1 1 0) surface and TiO x encapsulation layers

Applied Surface Science

Volumn 280, Issue , 2013, Pages 60-66

  Bugyi, László ^a   Óvári, László ^a   Kónya, Zoltán ^a  

^a UNIVERSITY OF SZEGED   (Hungary)

Author keywords

Charge transfer; Encapsulation; MIM device; Protecting oxide layer; Rhodium film; Self limited growth; Titanium dioxide template

Indexed keywords

CHARGE TRANSFER; DEPOSITION; ENCAPSULATION; FILM GROWTH; IONS; METAL INSULATOR BOUNDARIES; METALS; MULTILAYERS; OXYGEN; SINGLE CRYSTALS; STOICHIOMETRY; TITANIUM DIOXIDE; TITANIUM OXIDES; WORK FUNCTION;

METAL INSULATOR METALS; METAL OXIDE INTERFACE; NEGATIVE OXYGEN IONS; OXIDE LAYER; PROTECTIVE OXIDE LAYERS; SELF-LIMITED GROWTH; SURFACE WORK FUNCTIONS; TEMPERATURE CHARACTERISTIC;

MIM DEVICES;

EID: 84879689966     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.04.083     Document Type: Article

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