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Materials Letters

Volumn 107, Issue , 2013, Pages 111-114

The different structure characteristics of nanosized Co3O 4 film crystallized by the annealing and plasma techniques

(6) Chen, G L a,b Guyon, C b Zhang, Z X a Ognier, S b Beem, J c Tatoulian, M b

a ZHEJIANG SCI TECH UNIVERSITY (China)

b PSL RESEARCH UNIVERSITY (France)

c University of Oklahoma (United States)

Author keywords

Crystal structure; Functional XPS; Nanocrystalline materials; Plasma enhanced chemical vapor deposition

Indexed keywords

CALCINATIONS TEMPERATURE; CATALYTIC PROPERTIES; DIFFERENT STRUCTURE; HYDROCARBON OXIDATION; MICRO-CLUSTERS; PLASMA TECHNIQUES; SILICON SUBSTRATES; STRUCTURE DIFFERENCE;

ANNEALING; COBALT COMPOUNDS; CRYSTAL STRUCTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

COBALT;

EID: 84879468224 PISSN: 0167577X EISSN: None Source Type: Journal
DOI: 10.1016/j.matlet.2013.05.071 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.