Deposition of cobalt oxide thin films by plasma-enhanced chemical vapour deposition (PECVD) for catalytic applications

Surface and Coatings Technology

Volumn 206, Issue 7, 2011, Pages 1673-1679

  Guyon, C ^a   Barkallah, A ^b   Rousseau, F ^a   Giffard, K ^b   Morvan, D ^a   Tatoulian, M ^a  

^a PSL RESEARCH UNIVERSITY   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

Cobalt oxides; Cobalt organic composite thin film; MOPECVD; Ozonation catalysis; Plasma deposition

Indexed keywords

CATALYTIC APPLICATIONS; CATALYTIC OZONATION; CHEMICAL VAPOUR DEPOSITION; COBALT CARBONYL; COBALT NITRATES; COBALT OXIDES; COMPOSITE THIN FILMS; CRYSTALLINE FORM; CRYSTALLINE PHASE; GAS CARRIERS; LOW PRESSURE PLASMA; METAL ORGANIC; MINERALISATION; MOPECVD; NITRATE SALTS; POLYMERIC LAYERS; RF PLASMA; XRD;

ARGON; CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; COBALT COMPOUNDS; CRYSTALLINE MATERIALS; CRYSTALLITE SIZE; DEPOSITION; DISSOLVED OXYGEN; ELECTRIC DISCHARGES; ORGANIC POLLUTANTS; ORGANOMETALLICS; OXIDE FILMS; OZONE; OZONIZATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYMERIC FILMS; SPRAYED COATINGS; THIN FILMS; TUNGSTEN;

COBALT;

EID: 82755197140     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.09.060     Document Type: Article

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