Al-W alloy deposition from lewis acidic room-temperature chloroaluminate ionic liquid

ECS Transactions

Volumn 50, Issue 11, 2013, Pages 239-250

  Tsuda, Tetsuya ^a   Ikeda, Yuichi ^a   Arimura, Takashi ^a   Imanishi, Akihito ^a,b   Kuwabata, Susumu ^a,b   Hussey, Charles L ^c   Stafford, Gery R ^d  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITY OF MISSISSIPPI   (United States)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM CHLORIDE; BINARY ALLOYS; CHLORINE COMPOUNDS; ELECTRODEPOSITION; ELECTRODES; FUSED SALTS; IONIC LIQUIDS;

ALLOY DEPOSITION; ALUMINUM CHLORIDE-1-ETHYL-3-METHYLIMIDAZOLIUM CHLORIDE; AMORPHOUS PHASE; CHLORIDE CONTAMINATION; CHLOROALUMINATE IONIC LIQUIDS; PITTING POTENTIAL; ROOM TEMPERATURE IONIC LIQUIDS; SPUTTERING METHODS;

ALUMINUM ALLOYS;

EID: 84878502381     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/05011.0239ecst     Document Type: Conference Paper

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