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Volumn 102, Issue 20, 2013, Pages

Hole-blocking titanium-oxide/silicon heterojunction and its application to photovoltaics

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SILICONS; DEPOSITED FILMS; ITS APPLICATIONS; LOW TEMPERATURES; NANO-METER SCALE; PHOTOVOLTAICS; SUBSTRATE TEMPERATURE; WIDE BAND GAP;

EID: 84878369077     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4803446     Document Type: Article
Times cited : (193)

References (22)
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    • (1992) Proc, IEEE , vol.80 , pp. 571
    • Bean, J.C.1
  • 2
    • 33751258749 scopus 로고
    • 10.1016/0039-6028(83)90561-7
    • H. Kroemer, Surf. Sci. 132, 543 (1983). 10.1016/0039-6028(83)90561-7
    • (1983) Surf. Sci. , vol.132 , pp. 543
    • Kroemer, H.1
  • 10
    • 0025445393 scopus 로고
    • 10.1149/1.2086825
    • W. Kern, J. Electrochem. Soc. 137, 1887 (1990). 10.1149/1.2086825
    • (1990) J. Electrochem. Soc. , vol.137 , pp. 1887
    • Kern, W.1
  • 14
    • 0037233037 scopus 로고    scopus 로고
    • 10.1016/S0167-5729(02)00100-0
    • U. Diebold, Surf. Sci. Rep. 48, 53 (2003). 10.1016/S0167-5729(02)00100-0
    • (2003) Surf. Sci. Rep. , vol.48 , pp. 53
    • Diebold, U.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.