Hole-blocking titanium-oxide/silicon heterojunction and its application to photovoltaics

Applied Physics Letters

Volumn 102, Issue 20, 2013, Pages

  Avasthi, Sushobhan ^a   McClain, William E ^a,b   Man, Gabriel ^a   Kahn, Antoine ^a   Schwartz, Jeffrey ^a,b   Sturm, James C ^a  

^a Princeton University   (United States)

^b PRINCETON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SILICONS; DEPOSITED FILMS; ITS APPLICATIONS; LOW TEMPERATURES; NANO-METER SCALE; PHOTOVOLTAICS; SUBSTRATE TEMPERATURE; WIDE BAND GAP;

DEPOSITS; ENERGY GAP; GERMANIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SILICON; TITANIUM; TITANIUM OXIDES;

HETEROJUNCTIONS;

EID: 84878369077     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4803446     Document Type: Article

References (22)

1. J. C. Bean, Proc, IEEE 80, 571 (1992). 10.1109/5.135380
2. H. Kroemer, Surf. Sci. 132, 543 (1983). 10.1016/0039-6028(83)90561-7
3. J. C. Bean, L. C. Feldman, A. T. Fiory, S. Nakahara, and I. K. Robinson, J. Vac. Sci. Technol. A 2, 436 (1984). 10.1116/1.572361
4. J. Pelletier, D. Gervais, and C. Pomot, J. Appl. Phys. 55, 994 (1984). 10.1063/1.333156
5. C. Long, S. A. Ustin, and W. Ho, J. Appl. Phys. 86, 2509 (1999). 10.1063/1.371085
6. C. Martinet, V. Paillard, A. Gagnaire, and J. Joseph, J. Non-Cryst. Solids 216, 77 (1997). 10.1016/S0022-3093(97)00175-0
7. B. S. Richards, J. E. Cotter, and C. B. Honsberg, Appl. Phys. Lett. 80, 1123 (2002). 10.1063/1.1445810
8. W. D. Brown and W. W. Grannemann, Solid-State Electron. 21, 837 (1978). 10.1016/0038-1101(78)90308-8
9. D. Gebeyehu, C. J. Brabec, N. S. Sariciftci, D. Vangeneugden, R. Kiebooms, D. Vanderzande, F. Kienberger, and H. Schindler, Synth. Met. 125, 279 (2001). 10.1016/S0379-6779(01)00395-2
10. W. Kern, J. Electrochem. Soc. 137, 1887 (1990). 10.1149/1.2086825
11. T. J. Dennes and J. Schwartz, J. Am. Chem. Soc. 131, 3456 (2009). 10.1021/ja810075c
12. T. J. Dennes and J. Schwartz, ACS Appl. Mater. Interfaces 1, 2119 (2009). 10.1021/am9004946
13. R. Methaapanon and S. F. Bent, J. Phys. Chem. C 114, 10498 (2010). 10.1021/jp1013303
14. U. Diebold, Surf. Sci. Rep. 48, 53 (2003). 10.1016/S0167-5729(02)00100-0
15. J. Moulder, W. Stickle, P. Sobol, and K. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics, Inc., 1995).
16. P. Y. Huang, C. S. Ruiz-Vargas, A. M. van der Zande, W. S. Whitney, M. P. Levendorf, J. W. Kevek, S. Garg, J. S. Alden, C. J. Hustedt, Y. Zhu, J. Park, P. L. McEuen, and D. A. Muller, Nature 469, 389 (2011). 10.1038/nature09718
17. M. Ritala, M. Leskela, L. Niinisto, and P. Haussalo, Chem. Mater. 5 (8), 1174 (1993). 10.1021/cm00032a023
18. Y. W. Chung, W. J. Lo, and G. A. Somorjai, Surf. Sci. 64, 588 (1977). 10.1016/0039-6028(77)90064-4
19. H. C. Card, IEEE Trans. Electron Devices 23, 538 (1976). 10.1109/T-ED.1976.18449
20. H. J. Hovel and J. M. Woodall, J. Electrochem. Soc. 120, 1246 (1973) 10.1149/1.2403671.
21. M. Tanaka, M. Taguchi, T. Matsuyama, T. Sawada, S. Tsuda, S. Nakano, H. Hanafusa, and Y. Kuwano, Jpn. J. Appl. Phys., Part 1 31, 3518 (1992). 10.1143/JJAP.31.3518
22. S. Avasthi, S. Lee, Y. L. Loo, and J. Sturm, Adv. Mater. 23, 5762 (2011). 10.1002/adma.201102712