Diamond foam electrodes for electrochemical applications

Electrochemistry Communications

Volumn 33, Issue , 2013, Pages 88-91

  Kato, Hiromitsu ^a,b   Hees, Jakob ^b   Hoffmann, René ^b   Wolfer, Marco ^b   Yang, Nianjun ^b   Yamasaki, Satoshi ^a   Nebel, Christoph E ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

Diamond foam; Electrode; Heavily boron doping; Nano crystalline diamond; Surface enlargement

Indexed keywords

CHEMICAL SENSORS; CHEMICAL STABILITY; CRYSTALLINE MATERIALS; DIAMOND FILMS; DIAMONDS; ELECTRODES; PLASMA APPLICATIONS;

BORON-DOPING; DIAMOND ELECTRODE; ELECTROCHEMICAL APPLICATIONS; ELECTROCHEMICAL CHARACTERIZATIONS; FOAM ELECTRODES; MICROWAVE PLASMA REACTORS; NANO-CRYSTALLINE DIAMONDS; NANO-STRUCTURED ELECTRODES;

ELECTROCHEMICAL ELECTRODES;

EID: 84878226334     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2013.04.028     Document Type: Article

References (16)

1. P. Simon, Y. Gogotsi, Nature Materials 7 (2008) 845.
2. M. Armand, J.M. Tarascon, Nature 451 (2008) 652.
3. R.F. Service, Science 313 (2006) 902.
4. O. Kimizuka, O. Tanaike, J. Yamashita, T. Hiraoka, D.N. Futaba, K. Hata, K. Machida, S. Suematsu, K. Tamamitsu, S. Saeki, Y. Yamada, H. Hatori, Carbon 46 (2008) 1999.
5. A. Al-zubaidi, T. Inoue, T. Matsushita, Y. Ishii, T. Hashimoto, S. Kawasaki, Journal of Physical Chemistry C 116 (2012) 7681.
6. M. Hahn, M. Baertschi, O. Barbieri, J.C. Sauter, R. Kötz, R. Gallay, Electrochemical and Solid-State Letters 7 (2004) A33.
7. In: A. Fujishima, Y. Einaga, T.N. Rao, D.A. Tryk (Eds.), Diamond Electrochemistry, Elsevier-BKC, Tokyo, 2005.
8. C.E. Nebel, B. Rezek, D. Shin, H. Uetsuka, N. Yang, Journal of Physics D: Applied Physics 40 (2007) 6443.
9. W. Smirnov, A. Kriele, N. Yang, C.E. Nebel, Diamond and Related Materials 19 (2010) 186.
10. N. Yang, H. Uetsuka, E. Osawa, C.E. Nebel, Nano Letters 8 (2008) 3572.
11. M. Wei, C. Terashima, M. Lv, A. Fujishima, Z.-Z. Gu, Chemical Communications (2009) 3624.
12. D. Luo, J. Zhi, Electrochemistry Communications 11 (2009) 1093.
13. M. Füner, C. Wild, P. Koidl, Applied Physics Letters 72 (1998) 1149.
14. O.A. Williams, O. Douheret, M. Daenen, K. Haenen, E. Osawa, M. Takahashi, Chemical Physics Letters 445 (2007) 255.
15. W. Gajewski, P. Achatz, O.A. Williams, K. Haenen, E. Bustarret, M. Stutzmann, J.A. Garrido, Physics Review B 79 (2009) 045206.
16. A.J. Bard, L.R. Faulkner, Electrochemical Methods: Fundamentals and Applications, 2nd Wiley, 2001.