-
1
-
-
65449173197
-
-
10.1063/1.3122148
-
Y. Sakiyama, T. Tomai, M. Miyano, and D. B. Graves, Appl. Phys. Lett. 94, 161501 (2009). 10.1063/1.3122148
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 161501
-
-
Sakiyama, Y.1
Tomai, T.2
Miyano, M.3
Graves, D.B.4
-
2
-
-
79955409473
-
-
10.1063/1.3582923
-
D. C. Wang, D. Zhao, K. C. Feng, X. H. Zhang, D. P. Liu, and S. Yang, Appl. Phys. Lett. 98, 161501 (2011). 10.1063/1.3582923
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 161501
-
-
Wang, D.C.1
Zhao, D.2
Feng, K.C.3
Zhang, X.H.4
Liu, D.P.5
Yang, S.6
-
3
-
-
77956306894
-
-
10.1063/1.3474989
-
S. Peter, M. Guünther, D. Hauschild, and F. Richter, J. Appl. Phys. 108, 043303 (2010). 10.1063/1.3474989
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 043303
-
-
Peter, S.1
Guünther, M.2
Hauschild, D.3
Richter, F.4
-
4
-
-
33750594783
-
-
10.1088/0963-0252/15/4/027
-
D. Staack, B. Farouk, A. F. Gutsol, and A. A. Fridman, Plasma Sources Sci. Technol. 15, 818 (2006). 10.1088/0963-0252/15/4/027
-
(2006)
Plasma Sources Sci. Technol.
, vol.15
, pp. 818
-
-
Staack, D.1
Farouk, B.2
Gutsol, A.F.3
Fridman, A.A.4
-
6
-
-
51849157324
-
-
10.1063/1.2977674
-
X. P. Lu, T. Ye, Y. G. Cao, Z. Y. Sun, Q. Xiong, Z. Y. Tang, Z. L. Xiong, J. Hu, Z. H. Jiang, and Y. Pan, J. Appl. Phys. 104, 053309 (2008). 10.1063/1.2977674
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 053309
-
-
Lu, X.P.1
Ye, T.2
Cao, Y.G.3
Sun, Z.Y.4
Xiong, Q.5
Tang, Z.Y.6
Xiong, Z.L.7
Hu, J.8
Jiang, Z.H.9
Pan, Y.10
-
8
-
-
84860347847
-
-
10.1063/1.4705433
-
S. Z. Li, M. C. Xu, X. Zhang, and J. L. Zhang, Appl. Phys. Lett. 100, 174101 (2012). 10.1063/1.4705433
-
(2012)
Appl. Phys. Lett.
, vol.100
, pp. 174101
-
-
Li, S.Z.1
Xu, M.C.2
Zhang, X.3
Zhang, J.L.4
-
10
-
-
58149308629
-
-
10.1088/0022-3727/41/21/215203
-
T. Shao, K. H. Long, C. Zhang, P. Yan, S. C. Zhang, and R. Z. Pan, J. Phys. D: Appl. Phys. 41, 215203 (2008). 10.1088/0022-3727/41/21/215203
-
(2008)
J. Phys. D: Appl. Phys.
, vol.41
, pp. 215203
-
-
Shao, T.1
Long, K.H.2
Zhang, C.3
Yan, P.4
Zhang, S.C.5
Pan, R.Z.6
-
11
-
-
78751518325
-
-
10.1063/1.3540504
-
T. Shao, C. Zhang, Z. Niu, P. Yan, V. F. Tarasenko, E. Kh. Baksht, A. G. Burahenko, and Y. V. Shutko, Appl. Phys. Lett. 98, 021503 (2011). 10.1063/1.3540504
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 021503
-
-
Shao, T.1
Zhang, C.2
Niu, Z.3
Yan, P.4
Tarasenko, V.F.5
Kh. Baksht, E.6
Burahenko, A.G.7
Shutko, Y.V.8
-
13
-
-
70249138373
-
-
10.1088/0022-3727/42/12/125202
-
H. Ayan, A. Staack, G. Fridman, A. G. Gutosl, Y. Muknin, and A. Starikovskii, J. Phys. D: Appl. Phys. 42, 125202 (2009). 10.1088/0022-3727/42/ 12/125202
-
(2009)
J. Phys. D: Appl. Phys.
, vol.42
, pp. 125202
-
-
Ayan, H.1
Staack, A.2
Fridman, G.3
Gutosl, A.G.4
Muknin, Y.5
Starikovskii, A.6
-
14
-
-
84862225660
-
-
10.1088/0963-0252/21/3/035004
-
D. Z. Yang, Y. Yang, S. Z. Li, D. X. Nie, S. Zhang, and W. C. Wang, Plasma Sources Sci. Technol. 21, 035004 (2012). 10.1088/0963-0252/21/3/035004
-
(2012)
Plasma Sources Sci. Technol.
, vol.21
, pp. 035004
-
-
Yang, D.Z.1
Yang, Y.2
Li, S.Z.3
Nie, D.X.4
Zhang, S.5
Wang, W.C.6
-
15
-
-
33749429155
-
-
10.1088/0022-3727/39/20/016
-
J. M. Williamcom, D. D. Trump, P. Bletzinger, and B. N. Ganguly, J. Phys. D: Appl. Phys. 39, 4400 (2006). 10.1088/0022-3727/39/20/016
-
(2006)
J. Phys. D: Appl. Phys.
, vol.39
, pp. 4400
-
-
Williamcom, J.M.1
Trump, D.D.2
Bletzinger, P.3
Ganguly, B.N.4
-
16
-
-
33644505188
-
-
10.1063/1.2176866
-
V. F. Tarasenko, Appl. Phys. Lett. 88, 081501 (2006). 10.1063/1.2176866
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 081501
-
-
Tarasenko, V.F.1
-
19
-
-
20844438822
-
-
10.1063/1.1905801
-
K. Takaki, M. Hosokawa, T. Sasaki, S. Mukaigawa, and T. Fujiwara, Appl. Phys. Lett. 86, 151501 (2005). 10.1063/1.1905801
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 151501
-
-
Takaki, K.1
Hosokawa, M.2
Sasaki, T.3
Mukaigawa, S.4
Fujiwara, T.5
-
22
-
-
0038622923
-
-
10.1088/0963-0252/12/2/301
-
C. O. Laux, T. G. Spence, C. H. Kruger, and R. N. Zare, Plasma Sources Sci. Technol. 12, 125 (2003). 10.1088/0963-0252/12/2/301
-
(2003)
Plasma Sources Sci. Technol.
, vol.12
, pp. 125
-
-
Laux, C.O.1
Spence, T.G.2
Kruger, C.H.3
Zare, R.N.4
-
23
-
-
0035541876
-
-
10.1023/A:1012073800284
-
L. Yu, L. Pierrot, C. O. Laux, and C. H. Kruger, Plasma Chem. Plasma Process. 21, 483 (2001). 10.1023/A:1012073800284
-
(2001)
Plasma Chem. Plasma Process.
, vol.21
, pp. 483
-
-
Yu, L.1
Pierrot, L.2
Laux, C.O.3
Kruger, C.H.4
-
26
-
-
0037422652
-
-
10.1088/0022-3727/36/1/306
-
Yu. B. Golubovskii, V. A. Maiorov, J. F. Behnke, and J. F. Behnke, J. Phys. D: Appl. Phys. 36, 39 (2003). 10.1088/0022-3727/36/1/306
-
(2003)
J. Phys. D: Appl. Phys.
, vol.36
, pp. 39
-
-
Golubovskii, Yu.B.1
Maiorov, V.A.2
Behnke, J.F.3
Behnke, J.F.4
-
28
-
-
77955663787
-
-
10.1016/j.apsusc.2010.04.101
-
K. L. Wang, W. C. Wang, D. Z. Yang, Y. Huo, and D. Z. Wang, Appl. Surf. Sci. 256, 6859 (2010). 10.1016/j.apsusc.2010.04.101
-
(2010)
Appl. Surf. Sci.
, vol.256
, pp. 6859
-
-
Wang, K.L.1
Wang, W.C.2
Yang, D.Z.3
Huo, Y.4
Wang, D.Z.5
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