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Corrosion Engineering Science and Technology

Volumn 48, Issue 2, 2013, Pages 98-107

Corrosion inhibition of copper in hydrochloric acid by coverage with trithiocyanuric acid self-assembled monolayers

(6) Chen, W a,b Hong, S a Xiang, B c Luo, H Q a Li, M a Li, N B a

a SOUTHWEST UNIVERSITY (China)

b SHAANXI UNIVERSITY OF TECHNOLOGY (China)

c CHONGQING UNIVERSITY (China)

Author keywords

Adsorption; Copper; EIS; Polarisation; SAMs

Indexed keywords

CORROSION INHIBITION; EIS; HIGHEST OCCUPIED MOLECULAR ORBITAL; HYDROPHILIC SURFACES; LOWEST UNOCCUPIED MOLECULAR ORBITAL; QUANTUM CHEMICAL CALCULATIONS; SAMS; TRITHIOCYANURIC ACID;

ADSORPTION; CONTACT ANGLE; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROCHLORIC ACID; POLARIZATION; QUANTUM CHEMISTRY; SELF ASSEMBLED MONOLAYERS; SOLIDS;

COPPER;

EID: 84877815917 PISSN: 1478422X EISSN: 17432782 Source Type: Journal
DOI: 10.1179/1743278212Y.0000000053 Document Type: Article

Times cited : (39)

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