Fabrication and characterisation of thin film coaxial AC/DC resistors for the detremination of RK

18th IMEKO World Congress 2006: Metrology for a Sustainable Development

Volumn 3, Issue , 2006, Pages 2180-2183

  Bounouh, A ^a   Lapostolle, F ^b   Lamy, S ^b  

^a LABORATOIRE NATIONAL DE MÉTROLOGIE ET D ESSAIS LNE   (France)

^b UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD   (France)

Author keywords

AC measurements; Calculable resistance; Impedance; Thin films

Indexed keywords

AC MEASUREMENTS; CYLINDRICAL SUBSTRATE; ENERGY DISPERSIVE SPECTROSCOPIES (EDS); LAYER THICKNESS; RESISTANCE STANDARDS; RESISTANCE VALUES; STRUCTURAL CHARACTERIZATION;

ATOMIC FORCE MICROSCOPY; ELECTRIC IMPEDANCE; ENERGY DISPERSIVE SPECTROSCOPY; PLANNING; SCANNING ELECTRON MICROSCOPY; SUSTAINABLE DEVELOPMENT; UNITS OF MEASUREMENT;

THIN FILMS;

EID: 84877774450     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. J. Flowers, "The route to atomic and quantum standards", Science 306, 1324 (2004).
2. A.M. Thompson and D.G. Lampard, "A new theorem in electrostatics and its application to calculable standards capacitance", Nature, vol 177, pp. 888 (1956).
3. G. Trapon, O. Thevenot, J.C. Lacueille, W. Poirier, "Determination of the von Klitzing constant RK in terms of the BNM calculable capacitor - Fifteen years of investigations", Metrologia, n° 40, pp. 159 -171 (2003)
4. A. Bounouh, "Numerical computations and measurements on calculable resistance standards based on NiCr thin film" CPEM04-Digest, London, UK, pp. 370-371, July 2004.
5. A. Bounouh and S. Cadeau-belliard, "Calculations of ac resistance standard characteristics with Flux 3D software" VII AMCTM, Lisbon-Portugal, June 2005.