Interfacial reaction of Co-Fe films with SiO2 substrates

Acta Materialia

Volumn 61, Issue 11, 2013, Pages 4180-4190

  Bendersky, L A ^a   Kazantseva, N V ^a,c   Kattner, U R ^a   Wang, K ^a   Oleshko, V P ^a   Hunter, D ^b   Takeuchi, I ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c INSTITUTE OF METAL PHYSICS   (Russian Federation)

Author keywords

Co Fe films; Fe2SiO4; Interfacial reaction; Silicate; SiO2; TEM

Indexed keywords

ANALYTICAL TRANSMISSION ELECTRON MICROSCOPY; ANNEALING IN VACUUM; BODY-CENTERED CUBIC; CALCULATION OF PHASE DIAGRAMS; INTERDIFFUSION REACTIONS; MICROSTRUCTURAL CHANGES; SIO2; THERMODYNAMIC EVALUATION;

AMORPHOUS FILMS; COBALT; CRYSTAL MICROSTRUCTURE; DEPOSITS; IRON; METALLIC FILMS; OLIVINE; OXYGEN; SILICATES; SILICON OXIDES; SOLID SOLUTIONS; SUBSTRATES; SURFACE CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY;

INTERFACES (MATERIALS);

EID: 84877727673     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2013.03.044     Document Type: Article

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