Photolysis of bisphenol S in aqueous solutions and the effects of different surfactants

Reaction Kinetics, Mechanisms and Catalysis

Volumn 109, Issue 1, 2013, Pages 259-271

  Cao, Guiping ^a   He, Renling ^b   Cai, Zhengwei ^a   Liu, Jing ^a  

^a CHANGZHOU INSTITUTE OF TECHNOLOGY   (China)

^b Changzhou Institute of Energy Storage Materials and Devices   (China)

Author keywords

Bisphenol S; Cetyl trimethyl ammonium bromide; Photolysis; Polyoxyethylene lauryl ether; Sodium dodecyl sulfate; UV light

Indexed keywords

BISPHENOL S; CETYL TRIMETHYL AMMONIUM BROMIDES; CETYLTRIMETHYLAMMONIUM BROMIDE; DIFFERENT EFFECTS; FIRST ORDER KINETIC EQUATIONS; PHOTOLYSIS PATHWAY; POLYOXYETHYLENE LAURYL ETHERS; TIME OF FLIGHT MASS SPECTROMETRY;

CATIONIC SURFACTANTS; ETHERS; INTEGRAL EQUATIONS; LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; NONIONIC SURFACTANTS; PHENOLS; PHOTOLYSIS; POLYETHYLENE OXIDES; SODIUM DODECYL SULFATE; SOLUTIONS; ULTRAVIOLET RADIATION;

PHOTODEGRADATION;

EID: 84877725583     PISSN: 18785190     EISSN: 18785204     Source Type: Journal    
DOI: 10.1007/s11144-013-0553-6     Document Type: Article

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