Dependence of the capacitance between an electrode and an electrolyte solution on the thickness of aluminum oxide layers deposited using atomic layer deposition

Journal of Electroanalytical Chemistry

Volumn 700, Issue , 2013, Pages 8-11

  Lee, Hyunwoo ^a   Chang, Byoung Yong ^b   Kwack, Won Sub ^a   Jo, Kyungmin ^a   Jeong, Jinkyo ^a   Kwon, Se Hun ^a   Yang, Haesik ^a  

^a Pusan National University   (South Korea)

^b Pukyong National University   (South Korea)

Author keywords

Aluminum oxide; Atomic layer deposition; Capacitance; Electrical double layer; Indium tin oxide

Indexed keywords

CAPACITANCE; DEPOSITION; ELECTRODES; ELECTROLYTES; INSULATING MATERIALS; OXIDES; SCHEMATIC DIAGRAMS; SELF ASSEMBLED MONOLAYERS; TIN; TIN OXIDES;

ALUMINUM OXIDES; ELECTRICAL DOUBLE LAYERS; ELECTROACTIVE SPECIES; ELECTROLYTE SOLUTIONS; INDIUM TIN OXIDE; INDIUM TIN OXIDE ELECTRODES; LINEARLY PROPORTIONAL; POTENTIAL PROFILES;

ATOMIC LAYER DEPOSITION;

EID: 84877343587     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2013.04.008     Document Type: Article

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