Characterization of surface composition on Alloy 22 in neutral chloride solutions

Surface and Interface Analysis

Volumn 45, Issue 6, 2013, Pages 1014-1019

  Zagidulin, Dmitrij ^a   Zhang, Xiangrong ^a   Zhou, Jigang ^b   Noël, James J ^a   Shoesmith, David W ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b CANADIAN LIGHT SOURCE INC   (Canada)

Author keywords

Alloy 22; passive film; surface analysis

Indexed keywords

ALLOY 22; APPLIED POTENTIALS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY MEASUREMENTS; OXIDE BARRIER LAYERS; PASSIVE FILMS; SOLUTION INTERFACE; THRESHOLD POTENTIAL; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY;

ALLOYS; CERIUM ALLOYS; CHLORINE COMPOUNDS; CHROMIUM COMPOUNDS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; LUNAR SURFACE ANALYSIS; MOLYBDENUM; MOLYBDENUM OXIDE; OXIDE FILMS; PHOTOELECTRONS; SECONDARY ION MASS SPECTROMETRY; SURFACE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

TUNGSTEN;

EID: 84877057294     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5204     Document Type: Article

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