Nanoscale dynamic behavior of surface magnetic domains on a La 0.7Sr0.3MnO3 thin film

Journal of Nanoscience and Nanotechnology

Volumn 13, Issue 2, 2013, Pages 888-893

  Lin, Jin Han ^a   Lin, Yu Rong ^a   Wen, Teng Kai ^a   Devan, Rupesh S ^a   Liou, Yung ^b   Ma, Yuan Ron ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

^b INSTITUTE OF PHYSICS   (Taiwan)

Author keywords

La0.7Sr0.3MnO3 (LSMO) thin film surface; Magnetic force microscopy; Magnetic ripple pattern; Striped magnetic domains; Surface magnetic domain

Indexed keywords

ANTIFERROMAGNETIC STATE; DISCRETE PHASE; DYNAMIC BEHAVIORS; MAGNETIC FORCE MICROSCOPIES (MFM); MAGNETIC RIPPLES; MAGNETIC TIP; STRIPED MAGNETIC DOMAIN; THIN FILM SURFACES;

ANTIFERROMAGNETISM; FERROMAGNETIC MATERIALS; FERROMAGNETISM; INTERNET PROTOCOLS; MAGNETIC FORCE MICROSCOPY; MANGANESE OXIDE; THIN FILMS; THREE DIMENSIONAL;

MAGNETIC DOMAINS;

EID: 84876242824     PISSN: 15334880     EISSN: 15334899     Source Type: Journal    
DOI: 10.1166/jnn.2013.6094     Document Type: Conference Paper

References (40)

1. C. Zener, Phys. Rev. 82, 403 (1951).
2. R. von Helmot, J. Wecker, B. Hopzafel, L. Schultz, and K. Samwer, Phys. Rev. Lett. 71, 2331 (1993).
3. S. Jin, T. H. Tiefel, M. McCormack, R. A. Fastnacht, R. Ramesh, and L. H. Chen, Science 264, 413 (1994).
4. A. Wadas, M. Dreyer, M. Lohndorf, and R. Wiesendanger, Appl. Phys. A 64, 353 (1997).
5. K. Takano, R. H. Kodama, A. E. Berkowitz, W. Cao, and G. Thomas, Phys. Rev. Lett. 79, 1130 (1997).
6. K. Steenbeck and R. Hiergeist, Appl. Phys. Lett. 75, 1778 (1999).
7. F. Tsui, M. C. Smoak, T. K. Nath, and C. B. Eom, Appl. Phys. Lett. 76, 2421 (2000).
8. J. Dho, Y. N. Kim, Y. S. Hwang, J. C. Kim, and N. H. Hur, Appl. Phys. Lett. 82, 1434 (2003).
9. Z. H. Wang, G. Cristiani, and H.-U. Habermeier, Appl. Phys. Lett. 82, 3731 (2003).
10. C. Martin, A. Maignan, M. Hervieu, B. Raveau, and J. Hejtmanek, Eur. Phys. J. B 16, 469 (2000).
11. Y.-R. Ma, C.-H. Chueh, W.-L. Kuang, Y. Liou, and Y.-D. Yao, Surf. Sci. 507, 573 (2002).
12. Y.-R. Ma, C.-H. Chueh, W.-L. Kuang, Y. Liou, and Y.-D. Yao, J. Magn. Magn. Mater. 239, 371 (2002).
13. A. Asamitsu, Y. Moritomo, Y. Tomioka, T. Arima, and Y. Tokura, Nature 373, 407 (1995).
14. M. Uehara, S. Mori, C. H. Chen, and S. W. Cheong, Nature 399, 560 (1999).
15. Q. Lu, C.-C. Chen, and A. de Lozanne, Science 276, 2006 (1997).
16. T. Fukumura, H. Sugawara, T. Hasegawa, K. Tanaka, H. Sakaki, T. Kimura, and Y. Tokura, Science 284, 1969 (1999).
17. L. Zhang, C. Israel, A. Biswas, R. L. Greene, and A. de Lozanne, Science 298, 805 (2002).
18. M. Bowen, M. Bibes, A. Barthèlèmy, J.-P. Contour, A. Anane, Y. Lemaître, and A. Fert, Appl. Phys. Lett. 82, 233 (2003).
19. H.-I. Wu, J.-S. Chen, Y.-R. Ma, Y. Liou, and Y. D. Yao, IEEE Trans. Magn. 41, 3748 (2005).
20. J.-S. Chen, Y.-R. Ma, Y. Liou, and Y. D. Yao, J. Appl. Phys. 99, 08B702 (2006).
21. L. Hua, J. E. L. Bishop, and J. W. Tucker, J. Magn. Magn. Mater. 163, 285 (1996).
22. R. C. O'Handley, Modern Magnetic Materials: Principles and Applications, John Wiley & Sons, Inc., New York (2000).
23. J. M. Wesselinowa, J. Phys.: Condens. Matter 18, 8169 (2006).
24. C. Kwon, M. C. Robson, K.-C. Kim, J. Y. Gu, S. E. Lofland, S. M. Bhagat, Z. Trajanovic, M. Rajeswari, T. Venkatesan, A. R. Kratz, R. D. Gomez, and R. Ramesh, J. Magn. Magn. Mater. 172, 229 (1997).
25. C. Kwon, S. E. Lofland, S. M. Bhagat, M. Rajeswari, T. Venkatesan, A. R. Kratz, and R. D. Gomez, IEEE Tran. Magn. 33, 3964 (1997).
26. Y. Wu, Y. Suzuki, U. Rüdiger, J. Yu, A. D. Kent, T. K. Nath, and C. B. Eom, Appl. Phys. Lett. 75, 2295 (1999).
27. M. E. Hawley, G. W. Brown, P. C. Yashar, and C. Kwon, J. Cryst. Growth 211, 86 (2000).
28. T. W. Olson, J. M. W. Olson, A. Scholl, and Y. Suzuki, J. Appl. Phys. 95, 7354 (2004).
29. M. Liebmann, A. Schwarz, U. Kaiser, R. Wiesendanger, D.-W. Kim, and T.-W. Noh, Phys. Rev. B 71, 104431 (2005).
30. R. Allenspach, M. Stampanoni, and A. Bischof, Phys. Rev. Lett. 65, 3344 (1990).
31. M. Hehn, S. Padovani, K. Ounadjela, and J. P. Bucher, Phys. Rev. B 54, 3428 (1996).
32. V. Gehanno, A. Marty, B. Gilles, and Y. Samson, Phys. Rev. B 55, 12552 (1997).
33. V. Franco, X. Batlle, A. Valencia, A. Labarta, K. O'Gradya, and M. L. Watsonb, IEEE Tran. Magn. 34, 912 (1998).
34. X. Batlle and A. Labarta, J. Phys D: Appl. Phys. 35, R15 (2002).
35. A. Aharoni and J. P. Jakubovics, J. Appl. Phys. 73, 6498 (1993).
36. K. L. Babcock, V. B. Elings, J. Shi, D. D. Awschalom, and M. Dugas, Appl. Phys. Lett. 69, 705 (1996).
37. S. Huo, J. E. L. Bishop, J. W. Tucker, W. M. Rainforth, and H. A. Davies, J. Appl. Phys. 81, 4686 (1997).
38. H. J. Hug, B. Stiefel, P. J. A. van Schendel, A. Moser, R. Hofer, S. Martin, H.-J. Güntherodt, S. Porthun, L. Abelmann, J. C. Lodder, G. Bochi, and R. C. O'Handley, J. Appl. Phys. 83, 5609 (1998).
39. T. Kebe and A. Carl, J. Appl. Phys. 95, 775 (2004).
40. G.-C. Xie, C.-L. Lin, S.-Y. Gao, R. S. Devan, L.-M. Wang, S. Y. Wu, and Y.-R. Ma, J. Nanosci. Nanotechnol. 10, 4465 (2010).