Thickness and composition measurements of nanoelectronics multilayer thin films by energy dispersive spectroscopy (EDS)

Journal of Physics: Conference Series

Volumn 417, Issue 1, 2013, Pages

  Franquet, A ^a   Conard, T ^a   Gilbert, M ^a   Hantschel, T ^a   Vandervorst, W ^a,b  

^a IMEC   (Belgium)

^b KU LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; GATE DIELECTRICS; GERMANIUM; HIGH-K DIELECTRIC; MULTILAYER FILMS; MULTILAYERS; NANOELECTRONICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTRUM ANALYSIS; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPOSITION ANALYSIS; COMPOSITION MEASUREMENTS; ENERGY DISPERSIVE SPECTROSCOPIES (EDS); GATE DIELECTRIC APPLICATIONS; MULTI-LAYER THIN FILM; MULTILAYERED THIN FILMS; NANOELECTRONIC DEVICES; RUTHERFORD BACKSCATTERING SPECTROMETRY;

THIN FILMS;

EID: 84875902297     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/417/1/012033     Document Type: Conference Paper

References (3)

1. Conard T, K Arstila, T Hantschel, A Franquet, W Vandervorst, E Vecchio, S Burgess and F Bauer 2009 Mater. Res. Soc. Symp. Proc. 1184 HH08-08
2. Leng Y 2008 Materials Characterization: Introduction to Microscopic and Spectroscopic Methods (JohnWiley & Sons (Asia) Pte Ltd)
3. Koelling S, M Gilbert, J Goossens, A Hikavyy, O Richard and W Vandervorst 2009 Appl. Phys. Letter 95 144106