Composition quantification of microelectronics multilayer thin films by EDX: Toward small scale analysis

Materials Research Society Symposium Proceedings

Volumn 1184, Issue , 2009, Pages 191-196

  Conard, T ^a   Arstila, K ^a   Hantschel, T ^a   Franquet, A ^a   Vandervorst, W ^a,b   Vecchio, E ^a   Burgess, S ^c   Bauer, F ^d  

^a IMEC   (Belgium)

^b KU LEUVEN   (Belgium)

^c OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

^d Oxford Instruments GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; DIELECTRIC MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; GATE DIELECTRICS; HIGH-K DIELECTRIC; MICROELECTRONICS; MULTILAYER FILMS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICA; THIN FILM CIRCUITS;

COMPOSITION ANALYSIS; FUTURE GENERATIONS; HIGH-K MATERIALS; INTERCOMPARISONS; METROLOGY TOOLS; MULTI-LAYER THIN FILM; PROPER MODELING; THIN FILM ANALYSIS;

MULTILAYERS;

EID: 74049110840     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1184-hh08-08     Document Type: Conference Paper

References (5)

1. J.L. Pouchou, Analytica Chimica Acta, (1993) 283 p81
2. J.L. Pouchu, F. Pichoir and D. Boivin, Proc. ICEM 12, Seattle 1990; Microbeam Analysis, San Francisco Press (1990), 120; ONERA Report TP 1990-109.
3. I. Barkshire et al., Microchimica Acta 132 (2002) 113-128
4. Delabie, A.; Brunco, D.; Conard, T.; Favia, P.; Bender, H.; Franquet, A.; Sioncke, S.; Vandervorst, W.; Van Elshocht, S.; Heyns, M.; Meuris, M.; Kim, E.; McIntyre, P.; Saraswat, K.; LeBeau, J.; Cagnon, J.; Stemmer, S. and Tsai, W. Journal of the Electrochemical Society. Vol. 155: (12) H937-H944; 2008.
5. IMEC-Matsushita internal data, to be published