CVD of TiO2 and TiO2/Ag antimicrobial layers: Deposition from the hexanuclear μ-oxo Ti(IV) complex as a precursor, and the characterization

Surface and Coatings Technology

Volumn 222, Issue , 2013, Pages 38-43

  Piszczek, P ^a   Muchewicz, Z ^a   Radtke, A ^a   Gryglas, M ^a   Dahm, H ^a   Rozycki H ^a  

^a NICOLAUS COPERNICUS UNIVERSITY   (Poland)

Author keywords

Antimicrobial properties; CVD; Hexanuclear oxo titanium(IV) complex; Polycrystalline structure; TiO2 and TiO2 Ag layers

Indexed keywords

ANTI-MICROBIAL ACTIVITY; ANTI-MICROBIAL PROPERTIES; CHEMICAL VAPOR DEPOSITION PRECURSORS; POLYCRYSTALLINE STRUCTURE; POLYMORPHIC STRUCTURE; SUBSTRATE TEMPERATURE; TIO; X-RAY DIFFRACTION METHOD;

CHEMICAL VAPOR DEPOSITION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILVER; SUBSTRATES; TITANIUM; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84875810509     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.01.057     Document Type: Article

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