Evaluation of electrochemically active surface area of photosensitive copper oxide nanostructures with extremely high surface roughness

Electrochimica Acta

Volumn 98, Issue , 2013, Pages 109-115

  Juodkazyte, J ^a   Sebeka B ^a   Savickaja, I ^a   Selskis, A ^a   Jasulaitiene, V ^a   Kalinauskas, P ^a  

^a CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

Author keywords

Copper oxide; Electrochemically active surface area; Nanostructure; Photosensitive; Surface roughness

Indexed keywords

ELECTROCHEMICALLY ACTIVE SURFACE AREAS; NANOSTRUCTURED COPPER; NANOSTRUCTURED OXIDES; OXIDE NANOSTRUCTURES; PHOTOELECTROCHEMICAL TECHNIQUE; PHOTOSENSITIVE; POSSIBLE MECHANISMS; SURFACE ROUGHNESS FACTORS;

COPPER OXIDES; ELECTROCHEMICAL OXIDATION; LIGHT SENSITIVE MATERIALS; OXIDE FILMS; PHOTOELECTRONS; PHOTOSENSITIVITY; SCANNING ELECTRON MICROSCOPY; STRATEGIC MATERIALS; SURFACE ROUGHNESS; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOSTRUCTURES;

EID: 84875674700     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.03.068     Document Type: Article

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