Nucleation and growth of extremely thin cdse films electrodeposited from near-neutral electrolytes

Journal of the Electrochemical Society

Volumn 159, Issue 10, 2012, Pages

  Majidi, Hasti ^a   Van, Khoa T ^a   Baxterz, Jason B ^a  

^a Drexel University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS POTENTIAL; CDSE THIN FILMS; CURRENT TRANSIENTS; EXTREMELY THIN ABSORBER SOLAR CELLS; GROWTH MECHANISMS; NUCLEATION AND GROWTH; NUCLEATION DENSITIES; NUCLEATION SITES;

CHRONOAMPEROMETRY; COALESCENCE; ELECTRODEPOSITION; ELECTRON MICROSCOPY; FILM THICKNESS; NUCLEATION; POWER QUALITY; THIN FILMS;

FILM GROWTH;

EID: 84875622884     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.052210jes     Document Type: Article

References (45)

1. O. Oda, Compound Semiconductor Bulk Materials and Characterizations, p. 371, World Scientific Publishing, Hackensack (2007).
2. S. Gorer and G. Hodes, J. Phys. Chem., 98, 5338 (1994).
3. E. Lifshitz, I. Dag, I. Litvin, G. Hodes, S. Gorer, R. Reisfeld, M. Zelner, and H. Minti, Chem. Phys. Lett., 288, 188 (1998).
4. V. Ptatschek, B. Schreder, K. Herz, U. Hilbert, W. Ossau, G. Schottner, O. Rahäuser, T. Bischof, G. Lermann, A. Materny, W. Kiefer, G. Bacher, A. Forchel, D. Su, M. Giersig, G. Müller, and L. Spanhel, J. Phys. Chem. B, 101, 8898 (1997).
5. R. B. Kale, S. D. Sartale, B. K. Chougule, and D. C. Lokhande, Semicond. Sci. and Technol., 19, 980 (2004).
6. H. Lee, M. Wang, P. Chen, D. R. Gamelin, S. M. Zakeeruddin, M. Grätzel, and M. K. Nazeeruddin, Nano Lett., 9, 4221 (2009).
7. G. Hodes, E. Grunbaum, Y. Feldman, S. Bastide, and C. Levy-Clement, J. Electrochem. Soc., 152, G917 (2005).
8. H. Majidi and J. B. Baxter, Electrochim. Acta, 56, 2703 (2011).
9. Y. T. Kim, M. Y. Park, K. H. Choi, W. S. Tai, W. H. Shim, S.-Y. Park, J.-W. Kang, K. H. Lee, Y. Jeong, Y. D. Kim, and D. C. Lim, Journal of Nanoscience and Nanotechnology, 11, 2263 (2011).
10. S.-C. Kung, W. Xing, W. E. van der Veer, F. Yang, K. C. Donavan, M. Cheng, J. C. Hemminger, and R. M. Penner, Acs Nano, 5, 7627 (2011).
11. C. M. Shen, X. G. Zhang, and H. L. Li, Appl. Surf. Sci., 240, 34 (2005).
12. Y. G. Gudage, N. G. Deshpande, and R. Sharma, J. Phys. and Chem. of Solids, 70, 907 (2009).
13. K. Bieńkowski, M. Strawski, B. Maranowski, and M. Szklarczyk, Electrochim. Acta, 55, 8908 (2010).
14. J. Mallet, I. Kante, P. Fricoteaux, M. Molinari, and M. Troyon, Journal of Solid State Electrochemistry, 16, 1041 (2012).
15. S. Kutzmutz, G. Láng, and K. E. Heusler, Electrochim. Acta, 47, 955 (2001).
16. J. P. Szabo and M. Cocivera, J. Electrochem. Soc., 133, 1247 (1986).
17. R. Tena-Zaera, M. Ryan, A. Katty, G. Hodes, S. Bastide, and C. Levy-clement, Comptes Rendus Chimie, 9, 717 (2006).
18. H. Martín, P. Carro, A. Hernández Creus, S. González, R. C. Salvarezza, and A. J. Arvia, Langmuir, 13, 100 (1997).
19. A. Gomes, A. S. Viana, and M. I. da S. Pereira, J. Electrochem. Soc., 154, D452 (2007).
20. F. Lantelme, A. Seghiouer, and A. Derja, J. Appl. Electrochem., 28, 907 (1998).
21. R. Henríquez, A. Badán, P. Grez, E. Muñoz, J. Vera, E. A. Dalchiele, R. E. Marotti, and H. Gómez, Electrochim. Acta, 56, 4895 (2011).
22. E. Bosco and S. K. Rangarajan, J. Electroanal. Chem. and Interf. Electrochem., 134, 225 (1982).
23. G. Hodes, Chemical Solution Deposition of Semiconductor Films, p. 57, Marcel Dekker, New York (2003).
24. C. D. Lokhande, E. H. Lee, K. D. Jung, and O. S. Joo, Materials Chemistry and Physics, 91, 200 (2005).
25. R. K. Pandey, S. N. Sahu, and S. Chandra, in Handbook of Semiconductor Electrodeposition, p. 8, Marcel Dekker, New York (1996).
26. M. Paunovic and M. Schlesinger, Fundamentals of Electrochemical Deposition, 2nd ed., p. 91, Wiley, Hoboken, NJ (1998).
27. G. Hodes, Electrochemistry of Nanomaterials, p. 37, Wiley-VCH, Weinheim, (2001).
28. R. D. Armstrong, M. Fleischmann, and H. R. Thirsk, J. Electroanal. Chem., 11, 208 (1966).
29. M. Y. Abyaneh, Electrochim. Acta, 27, 1329 (1982).
30. R. K. Pandey, S. N. Sahu, and S. Chandra, Handbook of Semiconductor Electrodeposition, p. 18, Marcel Dekker, New York (1996).
31. Y. G. Li and A. Lasia, J. Appl. Electrochem., 26, 853 (1996).
32. M. Y. Abyaneh, J. Electroanal. Chem., 530, 82 (2002).
33. M. Y. Abyaneh, J. Electroanal. Chem. and Interf. Electrochem., 209, 1 (1986).
34. M. Y. Abyaneh, J. Electroanal. Chem., 387, 29 (1995).
35. B. Scharifker and G. Hills, Electrochim. Acta, 28, 879 (1983).
36. L. Heerman and A. Tarallo, J. Electroanal. Chem., 470, 70 (1999).
37. M. Y. Abyaneh, J. Electroanal. Chem., 586, 196 (2006).
38. M. Y. Abyaneh and M. Fleischmann, J. Electrochem. Soc., 138, 2491 (1991).
39. E. Bosco and S. K. Rangarajan, J. Electroanal. Chem. and Interf. Electrochem., 134, 213 (1982).
40. M. Y. Abyaneh, J. Electrochem. Soc., 151, C737 (2004).
41. R. K. Pandey, S. R. Kumar, A. J. N. Rooz, and S. Chandra, Thin Solid Films, 200, 1 (1991).
42. R. K. Pandey, S. R. Kumar, A. J. N. Rooz, and S. Chandra, J. Mater. Sci., 26, 7 (1991).
43. M. Avrami, J. Chem. Phys., 7, 1103 (1939).
44. H. Majidi, C. R. Winkler, M. L. Taheri, and J. B. Baxter, Nanotechnology, 23, 265701 (2012).
45. R. Tena-Zaera, A. Katty, S. Bastide, and C. Levy-clement, Chem. of Mater., 19, 1626 (2007).