Anisotropic magnetization behavior of electrodeposited nanocrystalline Ni-Mo alloy thin films and nanowires array

Journal of the Electrochemical Society

Volumn 159, Issue 10, 2012, Pages

  Ohgai, T ^a   Washio, R ^a,b   Tanaka, Y ^c  

^a NAGASAKI UNIVERSITY   (Japan)

^b MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^c TDK CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDIC AQUEOUS SOLUTION; ALLOY THIN FILMS; ANISOTROPIC MAGNETIZATION; COLUMNAR CRYSTALS; CROSS-SECTIONAL SCANNING; INDUCED CO DEPOSITIONS; NICKEL MOLYBDENUM; SOFT MAGNETIC PROPERTIES;

DEPOSITION; ELECTRODEPOSITION; MOLYBDENUM; MOLYBDENUM ALLOYS; NANOCRYSTALLINE ALLOYS; NANOWIRES; SATURATION MAGNETIZATION; THIN FILMS; VAPOR DEPOSITION;

NICKEL;

EID: 84875616124     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.013210jes     Document Type: Article

References (29)

1. E. J. Podlaha, M. Matlosz, and D. Landolt, J. Electrochem. Soc., 140, L149 (1993).
2. E. J. Podlaha and D. Landolt, J. Electrochem. Soc., 144, 1672 (1997).
3. Q. Zhou, P. J. Heard, and W. Schwarzacher, J. Appl. Phys., 109, 054313 (2011).
4. A. Brenner, Electrodeposition of Alloys, Academic Press, New York, London (1963).
5. L. S. Sanches, S. H. Domingues, C. E. B. Marino, and L. H. Mascaro, Electrochem. Commun., 6, 543 (2004).
6. E. Beltowska-Lehman and P. Indyka, Thin Solid Films, 520, 2046 (2012).
7. I. Koiwa, M. Usuda, K. Yamada, and T. Osaka, J. Electrochem. Soc., 135, 718 (1988).
8. E. Gómez, E. Pellicer, and E. Vallés, Electrochem. Commun., 6, 853 (2004).
9. T. Osaka, N. Kasai, and I. Koiwa, J. Electrochem. Soc., 130, 568 (1983).
10. J. Horkans, D. J. Seagle, and I. C. H. Chang, J. Electrochem. Soc., 137, 2056 (1990).
11. J. Verbeeck, O. I. Lebedev, G. V. Tendeloo, L. Cagnon, C. Bougerol, and G. Tourillon, J. Electrochem. Soc., 150, E468 (2003).
12. S. Z. Chu, S. Inoue, K. Wada, Y. Kanke, and K. Kurashima, J. Electrochem. Soc., 152, C42 (2005).
13. T. Ohgai, K. Hjort, R. Spohr, and R. Neumann, J. Appl. Electrochem., 38, 713 (2008).
14. S. Anandakumar, V. S. Rani, T. S. Ramulu, H. Yang, B. H. Lim, J. Kim, S. S. Yoon, and C. G. Kim, J. Electrochem. Soc., 158, E124 (2011).
15. M. D. L. Balela, S. Yagi, and E. Matsubara, J. Electrochem. Soc., 158, D210 (2011).
16. R. Spohr, C. Zet, B. E. Fischer, H. Kiesewetter, P. Apel, I. Gunko, T. Ohgai, and L. Westerberg, Nucl. Inst. Meth. Phys. Res. B, 268, 676 (2010).
17. H. Masuda and F. Hasegwa, J. Electrochem. Soc., 144, L127 (1997).
18. E. Chassaing, K. Vu Quang, and R. Wiart, J. Appl. Electrochem., 19, 839 (1989).
19. E. Uekawa, K. Murase, E. Matsubara, T. Hirato, and Y. Awakura, J. Electrochem. Soc., 145, 523 (1998).
20. K. Murase, H. Ando, E. Matsubara, T. Hirato, and Y. Awakura, J. Electrochem. Soc., 147, 2210 (2000).
21. H. Fukushima, T. Akiyama, S. Akagi, and K. Higashi, Trans. Jpn. Inst. Met., 20, 358 (1979).
22. H. Okamoto, J. Phase Equil., 12, 703 (1991).
23. M. Donten, H. Cesiulis, and Z. Stojek, Electrochim. Acta, 50, 1405 (2005).
24. O. Y. Metzler, L. Zhu, and E. Gileadi, Electrochim. Acta, 48, 2551 (2003).
25. E. Gómez, E. Pellicer, X. Alcobé, and E. Vallés, J. Solid State Electrochem., 8, 497 (2004).
26. S. I. Tanase, D. P. Tanase, M. Dobromir, and V. Georgescu, Appl. Surf. Sci., 257, 10903 (2011).
27. A. Hernando, P. Marin, M. Vazquez, J. M. Barandiaran, and G. Herzer, Phys. Rev. B, 58, 366 (1998).
28. L. Sun, P. C. Searson, and C. L. Chien, Appl. Phys. Lett., 74, 2803 (1999).
29. T. Ohgai, I. Enculescu, C. Zet, L. Westerberg, K. Hjort, R. Spohr, and R. Neumann, J. Appl. Electrochem., 36, 1157 (2006)