|
Volumn 4087, Issue , 2004, Pages 283-292
|
Role of photomask resolution on the performance of arrayed-waveguide grating devices
|
Author keywords
[No Author keywords available]
|
Indexed keywords
DESIGN PARAMETERS;
GRATING WAVEGUIDES;
HIGH RESOLUTION;
INDEX VARIATION;
MEASUREMENT RESULTS;
PHOTOLITHOGRAPHY PROCESS;
POWER DISTRIBUTIONS;
WAFER FABRICATIONS;
CROSSTALK;
DEMULTIPLEXING;
PHOTOMASKS;
RANDOM ERRORS;
WAVEGUIDES;
ARRAYED WAVEGUIDE GRATINGS;
|
EID: 84875477010
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.406412 Document Type: Conference Paper |
Times cited : (2)
|
References (8)
|