Enhancement of the positive emittance-switching performance of thermochromic VO2 films deposited on Al substrate for an efficient passive thermal control of spacecrafts

Current Applied Physics

Volumn 13, Issue 5, 2013, Pages 875-879

  Hendaoui, A ^a   Emond N ^a   Dorval, S ^a   Chaker, M ^a   Haddad, E ^b  

^a INRS EMT   (Canada)

^b MPB COMMUNICATIONS INC   (Canada)

Author keywords

Pulsed laser deposition; Smart radiator device; Thermochromic VO2; Thin film interference; Tunable emittance

Indexed keywords

EMITTANCES; HIGH TEMPERATURE; RADIATION ABSORPTION; REACTIVE PULSED LASER DEPOSITION; SMART RADIATOR DEVICE; TEMPERATURE DEPENDENCE; THERMO-CHROMIC; THIN-FILM INTERFERENCE;

DEPOSITS; INFRARED RADIATION; PULSED LASER DEPOSITION; RADIATORS; SILICON; SPACECRAFT; SUBSTRATES; THERMAL VARIABLES CONTROL;

ALUMINUM;

EID: 84875369025     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2012.12.028     Document Type: Article

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