Dielectric, Electromagnetic Interference Shielding and Absorption Properties of Si3N4-PyC Composite Ceramics

Journal of Materials Science and Technology

Volumn 29, Issue 3, 2013, Pages 249-254

  Hao, Xuan ^a   Yin, Xiaowei ^a   Zhang, Litong ^a   Cheng, Laifei ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Dielectric property; Electromagnetic interference shielding effectiveness; Reflection loss; Si3N4 PyC

Indexed keywords

ABSORPTION PROPERTY; DIELECTRIC PERMITTIVITIES; ELECTROMAGNETIC INTERFERENCE SHIELDING; ELECTROMAGNETIC INTERFERENCE SHIELDING EFFECTIVENESS; EMI SHIELDING EFFECTIVENESS; GRAPHITIZATION DEGREE; PRECURSOR INFILTRATION AND PYROLYSIS; REFLECTION LOSS;

DIELECTRIC PROPERTIES; ELECTRIC CONDUCTIVITY; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTROMAGNETIC PULSE; ELECTROMAGNETIC WAVE INTERFERENCE; MAGNETIC SHIELDING; NANOPARTICLES; NICKEL; PERMITTIVITY; PHENOLIC RESINS; PYROLYSIS; RESINS; SIGNAL INTERFERENCE; SILICON; SILICON NITRIDE;

CERAMIC MATERIALS;

EID: 84875254845     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmst.2013.01.011     Document Type: Article

References (26)

1. Mitomo M., Uesono S. J. Am. Ceram. Soc. 1992, 75:103-108.
2. Nishimura T., Mitomo M., Suematsu H. J. Mater. Res. 1997, 12:203-209.
3. Choi H.J., Lee J.G. J. Mater. Sci. 1997, 32:1937-1942.
4. Yin X.W., Li X.M., Zhang L.T. Int. J. Appl. Ceram. Technol. 2010, 7:391-399.
5. Yoon K.J., Wiederthon S.M., Luecke W.E. J. Am. Ceram. Soc. 2000, 83:2017-2022.
6. Li X.M., Yin X.W., Zhang L.T., Feng L.Y. Scripta Mater. 2010, 63:657-660.
7. Kleebe H.J., Pezzotti G., Ziegler G. J. Am. Ceram. Soc. 1999, 82:1857-1867.
8. Li X.M., Yin X.W., Zhang L.T., Cheng L.F. Mater. Sci. Eng. A 2009, 500:63-69.
9. Im J.S., Kim J.G., Lee Y.S. Carbon 2009, 47:2640-2647.
10. Kwon S.K., Ahn J.M., Kim G.H., Chun C.H. Polym. Eng. Sci. 2002, 42:2165-2171.
11. Fugetsu B., Sano E., Sunada M., Sambongi Y. Carbon 2008, 46:1256-1258.
12. Yang Y.L., Gupta M.C., Dudley K.L. Nano Lett. 2005, 5:2131-2134.
13. Song W.L., Cao M.S., Hou Z.L. Scripta Mater. 2009, 61:201-204.
14. Park S.H., Theilmann P., Yang K.Q. Appl. Phys. Lett. 2010, 96:043115.
15. Shi S.L., Liang J. Nanotechnology 2008, 19:255707.
16. Xiang C., Pan Y., Guo J. Ceram. Int. 2007, 33:1293-1297.
17. Wang J., Xiang C., Liu Q., Pan Y., Guo J. Adv. Funct. Mater. 2008, 18:2995-3002.
18. Calame J.P., Abe D.K. J. Am. Ceram. Soc. 2005, 88:2133-2142.
19. Li X.M., Zhang L.T., Yin X.W. J. Am. Ceram. Soc. 2012, 95:1038-1041.
20. Yin X.W., Xue Y.Y., Zhang L.T. Ceram. Int. 2012, 38:2421-2427.
21. Li Q., Yin X.W., Feng L.Y. Ceram. Int. 2012, 38:6015-6020.
22. Hong Y.K., Lee C.Y., Jeong C.K. Curr. Appl. Phys. 2001, 1:439-442.
23. Bronikowski M.J. Carbon 2006, 44:2822-2832.
24. Kingery W.D., Bowen H.K., Uhlmann D.R. Introduction to Ceramics 1976, John Wiley and Sons, New York.
25. Al-Saleh M.H., Sundararaj U. Carbon 2009, 47:1738-1746.
26. Yusoff A.N., Abdullah M.H., Ahmad S.H. J. Appl. Phys. 2002, 92:876-882.