Structural, morphological, electrical and optical studies of Cr doped SnO2 thin films deposited by the spray pyrolysis technique

Materials Science in Semiconductor Processing

Volumn 16, Issue 2, 2013, Pages 472-479

  Gandhi, T Indira ^a   Ramesh Babu, R ^a   Ramamurthi, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

Author keywords

Electrical properties; Optical properties; Scanning electron microscopy; Thin film; Tin oxide; X ray diffraction

Indexed keywords

CR CONCENTRATION; CR DOPED TIN OXIDES; ELECTRICAL AND OPTICAL PROPERTIES; GLASS SUBSTRATES; SCANNING ELECTRON MICROSCOPIC; SPRAY-PYROLYSIS TECHNIQUES; TETRAGONAL CRYSTAL STRUCTURE; X RAY PHOTOELECTRON SPECTRA;

CHLORINE COMPOUNDS; CHROMIUM; DEPOSITS; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOGRAPHY; SCANNING ELECTRON MICROSCOPY; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; TIN; TIN OXIDES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC PROPERTIES;

EID: 84875225124     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2012.07.008     Document Type: Article

References (45)

1. H. Cao, X. Qiu, Y. Liang, L. Zhang, M. Zhao, and Q. Zhu Chem. Phys. Chem. 7 2006 497 501
2. B. Drevillion, K. Satyendra, P. Rocaicabarrocas, and J.M. Siffert Applied Physics Letters 54 1989 2088 2091
3. S.J. Laverty, H. Feng, and P. Maguire Journal of the Electrochemical Society 144 1997 2165 2170
4. M.H. Madhusudhana Reddy, and A.N. Chandorkar Thin Solid Films 349 1999 260 265
5. G. Frank, E. Kaur, and H. Kostlin Sol Energy Materials 8 1983 387 398
6. Y. Faber, F.K. Arefi, and J. Amouroux Thin Solid Films 241 1994 282 286
7. T. Pisarkiewicz, and T. Stapinski Thin Solid Films 174 1989 277 283
8. D. Zhang, L. Tao, Z. deng, J. Zhang, and L. Chen Materials Chemistry and Physics 100 2006 275 280
9. Jeffrey W. Elam, David A. Baker, Alexander J. Hryn, Alex B.F. Martinson, Michael J. Pellin, and Joseph T. Hupp Journal of Vacuum Science & Technology A 2008 245 252
10. M.A. El Khakani, R. Dolbec, A.M. Serventi, M.C. Horrillo, M. Trudeau, R.G. Saint-Jacques, D.D. Rickerby, and I. Sayago Sensors and Actuators B: Chemical 77 2001 383 388
11. D. Debaiyoti, and R. Banerjee Thin Solid Films 147 1987 321 331
12. Q. Chen, Y. Qian, Z. Chen, G. Zhou, and Y. Zhang Thin Solid Films 264 1995 25 27
13. S.P.S. Arya Crystal Research and Technology 21 1986 K38 K42
14. H. Cachet, J. Bruneaux, G. Folcher, C. Levy-Clement, C. Vard, and M. Neumann-Spallart Solar Energy Materials & Solar Cells 46 1997 101 114
15. E. Elangovan, and K. Ramamurthi Thin Solid Films 476 2005 231 236
16. S. Shanthi, C. Subramanian, and P. Ramasamy Journal of Crystal Growth 197 1999 858 864
17. K.Y. Rajpure, M.N. Kusumade, M.N. Neumann-Spallart, and C.H. Bhosale Materials Chemistry and Physics 64 2000 184 188
18. P.K. Manoj, B. Joseph, V.K. Vaidyan, and D.S.D. Amma Ceramics International 33 2007 273 278
19. M.-M. Bagheri-Mohagheghi, and M. Shokooh-Saremi Semiconductor Science and Technology 19 2004 764 769
20. B. Stjerna, and C.G. Granqvist Journal of Physics D: Applied Physics 26 1993 1011 1012
21. Y. Huang, Q. Zhang, and G. Li Semiconductor Science and Technology 24 2009 015003 (5 pp.)
22. I. Stambolova, K. Konstantinov, S. Vassilev, P. Peshev, and T. Tsacheva Materials Chemistry and Physics 63 2000 104 108
23. J. Joseph, V. Mathew, J. Mathew, and K.E. Abraham Turkish Journal of Physics 33 2009 37 47
24. Q. He, W. Tu, and J. Hu Journal of Materials Science 42 2007 8292 8297
25. C.H. Liu, L. Zhang, He Yuan-Jin, and C.H. Liu Thin Solid Films 304 1997 13 15
26. R. Rella, A. Serra, P. Siciliano, L. Vasanelli, G. De, A. Licciulli, and A. Quirini Sensors and Actuators B: Chemical 44 1997 462 467
27. M.A.L. Pinheiro, T.F. Pineiz, E.A. de Morais, L.V.A. Scalvi, M.J. Saeki, and A.A. Cavalheiro Thin Solid Films 517 2008 976 981
28. G. Korotcenkov, and S.D. Han Materials Chemistry and Physics 113 2009 756 763
29. J. Joseph, V. Mathew, and K.E. Abraham Chinese Journal of Physics 45 2007 84 97
30. Jian Li, Shan Liu, and Wei Pan Key Engineering Materials 368-372 2008 524
31. S.J. Liu, L.Y. Chen, C.Y. Liu, H.W. Fang, J.H. Hsieh, and J.Y. Juang Applied Surface Science 257 2011 2254 2258
32. S. Morandi, E. Comini, G. Faglia, and G. Ghiotti Sensors and Actuators B: Chemical 118 2006 142 148
33. L. Jia, W. Cai, and H. Wang Applied Physics Letters 96 2010 103115 103117
34. N.H. Hong, J. Sakai, W. Prellier, and A. Hassini Journal of Physics: Condensed Matter 17 2005 1697 1702
35. E. Elangovan, and K. Ramamurthi Journal of Optoelectronics and Advanced Materials 5 2003 45 54
36. JCPDS-International Centre for Diffraction Data, Card no. 41-1445, 1997.
37. B.D. Cullity Elements of X-ray diffraction Second ed. 1978 Addison-Wesley Inc. Reading, Massachusetts
38. S.L. Shupack Environmental Health Perspectives 92 1991 7 11
39. T. Mega, K. Takao, and J. Shimomura Applied Surface Science 121/122 1997 120 124
40. W.Z. Samad, M.M. Salleh, A. Shafiee, and M.A. Yarmo Sains Malaysiana 40 3 2011 251 257
41. H.S. Nalwa Handbook of Thin Film Materials: Deposition and processing of thin films 2002 Academic Press London
42. G. Sberveglieri, S. Groppelli, P. Nelli, V. Lantto, H. Torvela, P. Romppainen, and S. Leppävuori Sensors and Actuators B-Chemical 1 1990 79 82
43. F. Solymosi, and J. Kiss Journal of Catalysis 54 1978 42 51
44. M. de la L. Olvera, A. Maldonado, Y. Matsumoto, R. Asomoza, M. Melendez-Lira, and D.R. Acosta Journal of Vaccuum Science and Technology A 19 2001 2097 2101
45. E. Elangovan, and K. Ramamurthi Crystal Research and Technology 38 2003 779 784