Electrochemical behavior of gold (I) in dimethylsulfoxide

Electrochimica Acta

Volumn 95, Issue , 2013, Pages 179-184

  Le, Wei ^a   Du, Kai ^a   Zhang, Lin ^a   Xiao, Jiang ^a   Zhang, Chao ^a   Zhang, Yunwang ^a   Zhou, Lan ^a   Yin, Qiang ^a  

^a RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Diffusion coefficient; Dimethylsulfoxide (DMSO); Gold electrodeposition; Nucleation and growth kinetics

Indexed keywords

DIFFUSION-CONTROLLED; ELECTROCHEMICAL BEHAVIORS; GOLD ELECTRODEPOSITION; IRREVERSIBLE PROCESS; NUCLEATION AND GROWTH KINETICS; NUCLEATION KINETICS; OPTIMUM TEMPERATURE; PROGRESSIVE NUCLEATION;

AMORPHOUS ALLOYS; CHRONOAMPEROMETRY; CYCLIC VOLTAMMETRY; DEPOSITS; DIFFUSION; ELECTRODEPOSITION; GOLD DEPOSITS; KINETICS; NUCLEATION; SCANNING ELECTRON MICROSCOPY; STATISTICAL MECHANICS;

GOLD;

EID: 84874940326     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2013.02.015     Document Type: Article

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