Electrochemical behavior of Tm3+ ion and cyclic electrodeposition of a Tm-Co alloy film in dimethylsulfoxide

Journal of Electroanalytical Chemistry

Volumn 536, Issue 1-2, 2002, Pages 123-127

  Yuan, Dingsheng ^a   Liu, Guankun ^a   Tong, Yexiang ^a  

^a SUN YAT SEN UNIVERSITY   (China)

Author keywords

Cyclic electrodeposition; Diffusion coefficient; Thulium; Tm Co alloy film; Transfer coefficient

Indexed keywords

AMORPHOUS MATERIALS; COBALT ALLOYS; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ELECTRODEPOSITION; POSITIVE IONS; REDUCTION; SCANNING ELECTRON MICROSCOPY; THULIUM ALLOYS; X RAY DIFFRACTION ANALYSIS;

ALLOY FILMS;

THIN FILMS;

EID: 0037110493     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(02)01211-1     Document Type: Article

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